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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 25 — Sep. 1, 2013
  • pp: 6126–6130

Stability and normal incidence reflectivity of W/B4C multilayer mirror near the boron K absorption edge

P. N. Rao, S. K. Rai, M. Nayak, and G. S. Lodha  »View Author Affiliations

Applied Optics, Vol. 52, Issue 25, pp. 6126-6130 (2013)

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A multilayer structure consisting of alternate layers of W and B4C has been deposited using a magnetron sputtering system. The structure of the as-deposited and vacuum-annealed W/B4C multilayer sample has been characterized using grazing incidence x-ray reflectivity, grazing incidence diffraction, and the normal incidence reflectivity has been measured using synchrotron radiation. A two-layer model consisting of tungsten and boron carbide is presented. The multilayer structure was found to be stable after 800°C annealing. Grazing incidence x-ray diffraction measurements suggested that W is polycrystalline with small grain size. No signature of tungsten carbide or tungsten boride formation could be observed during the annealing treatments. A near normal incidence soft x-ray reflectivity (SXRR) of 8.3% was obtained at 6.8 nm wavelength. A little drop (1%) in SXRR after 800°C annealing suggested that there were no compositional changes within the layers during the annealing treatments.

© 2013 Optical Society of America

OCIS Codes
(230.4170) Optical devices : Multilayers
(310.6870) Thin films : Thin films, other properties
(340.7470) X-ray optics : X-ray mirrors
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
X-ray Optics

Original Manuscript: June 6, 2013
Revised Manuscript: July 23, 2013
Manuscript Accepted: July 23, 2013
Published: August 22, 2013

P. N. Rao, S. K. Rai, M. Nayak, and G. S. Lodha, "Stability and normal incidence reflectivity of W/B4C multilayer mirror near the boron K absorption edge," Appl. Opt. 52, 6126-6130 (2013)

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