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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 7 — Mar. 1, 2013
  • pp: 1368–1376

Laser damage resistance of ion-beam sputtered Sc2O3/SiO2 mixture optical coatings

Mathias Mende, Stefan Schrameyer, Henrik Ehlers, Detlev Ristau, and Laurent Gallais  »View Author Affiliations

Applied Optics, Vol. 52, Issue 7, pp. 1368-1376 (2013)

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We report on the correlation between the laser damage resistance, the optical and the physical properties of Sc2O3/SiO2 mixture coatings. Several sets of samples with ten different mixture ratios have been prepared by ion-beam sputtering. The atomic compositions of the mixture thin films are quantified employing x-ray photoelectron spectroscopy depth profiles. Laser-induced damage thresholds are determined with single subpicosecond pulses (500 fs) at 1030 nm. Furthermore, Son1 multishot measurements are realized in the ultraviolet wavelength range (355 nm) at pulse durations of 5 ns. In addition, the influence of two different substrate polishing qualities on the radiation resistance of the composite thin films is discussed.

© 2013 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.0310) Thin films : Thin films
(320.0320) Ultrafast optics : Ultrafast optics

ToC Category:
Lasers and Laser Optics

Original Manuscript: November 16, 2012
Manuscript Accepted: January 11, 2013
Published: February 22, 2013

Mathias Mende, Stefan Schrameyer, Henrik Ehlers, Detlev Ristau, and Laurent Gallais, "Laser damage resistance of ion-beam sputtered Sc2O3/SiO2 mixture optical coatings," Appl. Opt. 52, 1368-1376 (2013)

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  1. S. M. J. Akhtar, D. Ristau, J. Ebert, and H. Welling, “Characterization of dielectric films and damage threshold at 1.064 μm,” Phys. Status Solidi A 115, 191–198 (1989). [CrossRef]
  2. B. Andre, L. Poupinet, and G. Ravel, “Evaporation and ion assisted deposition of HfO2 coatings: some key points for high power applications,” J. Vac. Sci. Technol. A 18, 2372–2377 (2000). [CrossRef]
  3. C. J. Stolz, M. D. Thomas, and A. J. Griffin, “BDS thin film damage competition,” Proc. SPIE 7132, 71320C (2008). [CrossRef]
  4. B. Langdon, D. Patel, E. Krous, J. J. Rocca, C. S. Menoni, F. Tomasel, S. Kholi, P. R. McCurdy, P. Langston, and A. Ogloza, “Influence of process conditions on the optical properties HfO2/SiO2 thin films for high power laser coatings,” Proc. SPIE 6720, 67200X (2007). [CrossRef]
  5. L. Gallais, B. Mangote, M. Zerrad, M. Commandré, A. Melninkaitis, J. Mirauskas, M. Jeskevic, and V. Sirutkaitis, “Laser-induced damage of hafnia coatings as a function of pulse duration in the femtosecond to nanosecond range,” Appl. Opt. 50, C178–C187 (2011). [CrossRef]
  6. L. O. Jensen, M. Mende, H. Blaschke, D. Ristau, D. Nguyen, L. Emmert, and W. Rudolph, “Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses,” Proc. SPIE 7842, 784207 (2010). [CrossRef]
  7. W. Heitmann, “Reactively evaporated films of scandia and yttria,” Appl. Opt. 12, 394–397 (1973). [CrossRef]
  8. M. F. Al-Kuhaili, “Optical properties of scandium oxide films prepared by electron beam evaporation,” Thin Solid Films 426, 178–185 (2003). [CrossRef]
  9. G. Liu, Y. Jin, H. He, and Z. Fan, “Effect of substrate temperatures on the optical properties of evaporated Sc2O3 thin films,” Thin Solid Films 518, 2920–2923 (2010). [CrossRef]
  10. F. Rainer, W. H. Lowdermilk, D. Milam, T. Tuttle Hart, T. L. Lichtenstein, and C. K. Carniglia, “Scandium oxide coatings for high-power UV laser applications,” Appl. Opt. 21, 3685–3688 (1982). [CrossRef]
  11. S. Tamura, S. Kimura, Y. Sato, H. Yoshida, and K. Yoshida, “Laser-damage threshold of Sc2O3/SiO2 high reflector coatings for a laser wavelength of 355 nm,” Thin Solid Films 228, 222–224 (1993). [CrossRef]
  12. C. S. Menoni, E. M. Krous, D. Patel, P. Langston, J. Tollerud, D. N. Nguyen, L. A. Emmert, A. Markosyan, R. Route, M. Fejer, and W. Rudolph, “Advances in ion beam sputtered Sc2O3 for optical interference coatings,” Proc. SPIE 7842, 784202 (2010). [CrossRef]
  13. M. Lappschies, B. Görtz, and D. Ristau, “Application of optical broadband monitoring to quasi-rugate filters by ion-beam sputtering,” Appl. Opt. 45, 1502–1506 (2006). [CrossRef]
  14. A. Melninkaitis, T. Tolenis, L. Mažulė, J. Mirauskas, V. Sirutkaitis, B. Mangote, X. Fu, M. Zerrad, L. Gallais, M. Commandré, S. Kičas, and R. Drazdys, “Characterization of zirconia– and niobia–silica mixture coatings produced by ion-beam sputtering,” Appl. Opt. 50, C188–C196 (2011). [CrossRef]
  15. D. Nguyen, L. A. Emmert, I. V. Cravetchi, M. Mero, W. Rudolph, M. Jupe, M. Lappschies, K. Starke, and D. Ristau, “TixSi1−xO2 optical coatings with tunable index and their response to intense subpicosecond laser pulse irradiation,” Appl. Phys. Lett. 93, 261903 (2008). [CrossRef]
  16. B. Mangote, L. Gallais, M. Commandré, M. Mende, L. Jensen, H. Ehlers, M. Jupé, D. Ristau, A. Melninkaitis, J. Mirauskas, V. Sirutkaitis, S. Kičas, T. Tolenis, and R. Drazdys, “Femtosecond laser damage resistance of oxide and mixture oxide optical coatings,” Opt. Lett. 37, 1478–1480 (2012). [CrossRef]
  17. M. Mende, L. O. Jensen, H. Ehlers, W. Riggers, H. Blaschke, and D. Ristau, “Laser-induced damage of pure and mixture material high reflectors for 355 nm and 1064 nm wavelength,” Proc. SPIE 8168, 816821 (2011). [CrossRef]
  18. D. Ristau, H. Ehlers, T. Gross, and M. Lappschies, “Optical broadband monitoring of conventional and ion processes,” Appl. Opt. 45, 1495–1501 (2006). [CrossRef]
  19. H. Blaschke, J. Kohlhaas, P. Kadkhoda, and D. Ristau, “DUV/VUV spectrophotometry for high precision spectral characterization,” Proc. SPIE 4932, 536 (2003). [CrossRef]
  20. M. Dieckmann, “SPEKTRUM, thin film design software,” Laser Zentrum Hannover e.V., 1990–2012.
  21. E. C. Freeman and William Paul, “Optical constants of rf sputtered hydrogenated amorphous Si,” Phys. Rev. B 20, 716–728 (1979). [CrossRef]
  22. J. Tauc, R. Grigorovici, and A. Vancu, “Optical properties and electronic structure of amorphous germanium,” Phys. Status Solidi B 15, 627–637 (1966). [CrossRef]
  23. G. D. Cody, T. Tiedje, B. Abeles, B. Brooks, and Y. Goldstein, “Disorder and the optical-absorption edge of hydrogenated amorphous silicon,” Phys. Rev. Lett. 47, 1480–1483 (1981). [CrossRef]
  24. B. Mangote, L. Gallais, M. Zerrad, F. Lemarchand, L. H. Gao, M. Commandré, and M. Lequime, “A high accuracy femto-/picosecond laser damage test facility dedicated to the study of optical thin films,” Rev. Sci. Instrum. 83, 013109 (2012). [CrossRef]
  25. ISO 21254:2011, “Test methods for laser-induced damage threshold,” International Organization for Standardization.
  26. H. Krol, L. Gallais, M. Commandré, C. Grézes-Besset, D. Torricini, and G. Lagier, “Influence of polishing and cleaning on the laser-induced damage threshold of substrates and coatings at 1064 nm,” Opt. Eng. 46, 023402 (2007). [CrossRef]
  27. B. J. Pond, J. I. DeBar, C. K. Carniglia, and T. Raj, “Stress reduction in ion beam sputtered mixed oxide films,” Appl. Opt. 28, 2800–2805 (1989). [CrossRef]
  28. C.-C. Lee and C.-J. Tang, “TiO2−Ta2O5 composite thin films deposited by radio frequency ion-beam sputtering,” Appl. Opt. 45, 9125–9131 (2006). [CrossRef]
  29. X. Wang, H. Masumoto, Y. Someno, and T. Hirai, “Microstructure and optical properties of amorphous TiO2−SiO2 composite films synthesized by helicon plasma sputtering,” Thin Solid Films 338, 105–109 (1999). [CrossRef]
  30. J.-S. Chen, S. Chao, J.-S. Kao, H. Niu, and C.-H. Chen, “Mixed films of TiO2−SiO2 deposited by double electron-beam coevaporation,” Appl. Opt. 35, 90–96 (1996). [CrossRef]
  31. H. A. Lorentz, “Über die Beziehung zwischen der Fortpflanzungsgeschwindigkeit des Lichtes und der Körperdichte,” Ann. Phys. Chem. 245, 641–665 (1880). [CrossRef]
  32. L. Lorenz, “Über die Refractionsconstante,” Ann. Phys. Chem. 247, 70–103 (1880). [CrossRef]
  33. H. Demiryont, “Optical properties of SiO2−TiO2 composite films,” Appl. Opt. 24, 2547–2650 (1985). [CrossRef]
  34. M. Cevro, “Ion-beam sputtering of (Ta2O5)x−(SiO2)1−x composite thin films,” Thin Solid Films 258, 91–103 (1995). [CrossRef]
  35. M. Mero, B. Clapp, J. C. Jasapara, W. Rudolph, D. Ristau, K. Starke, J. Krüger, S. Martin, and W. Kautek, “On the damage behavior of dielectric films when illuminated with multiple femtosecond laser pulses,” Opt. Eng. 44, 051107 (2005). [CrossRef]
  36. M. Jupé, M. Mende, C. Kolleck, D. Ristau, L. Gallais, and B. Mangote, “Measurement and calculation of ternary oxide mixtures for thin films for ultra short pulse laser optics,” Proc. SPIE 8190, 819004 (2011). [CrossRef]

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