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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 1 — Jan. 1, 2014
  • pp: 90–95

Flat-stitching error analysis of large-aperture photon sieves

Guang Jin, Junliang Yan, Hua Liu, Xing Zhong, and Yong Yan  »View Author Affiliations

Applied Optics, Vol. 53, Issue 1, pp. 90-95 (2014)

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Large aperture can be easily achieved by employing photon sieves fabricated on the stitching membrane, which are suitable for packaging and folding. We have done research to find out the image quality degradation caused by stitching. A simulation has been done to investigate the behavior of the stitching wavefront. 10×10 pieces have been used as a model, and their wavefront error has been evaluated using the wavefront method discussed in this work. Besides, we find that the errors in the outer zones are more remarkable than in the inner ones of the same photon sieve. Testing and alignment directions based on this method are also mentioned in this work.

© 2013 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(110.3000) Imaging systems : Image quality assessment
(110.4100) Imaging systems : Modulation transfer function
(220.1140) Optical design and fabrication : Alignment

ToC Category:
Imaging Systems

Original Manuscript: September 23, 2013
Revised Manuscript: November 20, 2013
Manuscript Accepted: November 26, 2013
Published: December 23, 2013

Guang Jin, Junliang Yan, Hua Liu, Xing Zhong, and Yong Yan, "Flat-stitching error analysis of large-aperture photon sieves," Appl. Opt. 53, 90-95 (2014)

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