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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 13 — May. 1, 2014
  • pp: 2942–2948

Fabrication and characterization of a deep ultraviolet wire grid polarizer with a chromium-oxide subwavelength grating

Kosuke Asano, Satoshi Yokoyama, Atsushi Kemmochi, and Toyohiko Yatagai  »View Author Affiliations


Applied Optics, Vol. 53, Issue 13, pp. 2942-2948 (2014)
http://dx.doi.org/10.1364/AO.53.002942


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Abstract

A wire grid polarizer comprised of chromium oxide is designed for a micro-lithography system using an ArF excimer laser. Optical properties for some material candidates are calculated using a rigorous coupled-wave analysis. The chromium oxide wire grid polarizer with a 90 nm period is fabricated by a double-patterning technique using KrF lithography and dry etching. The extinction ratio of the grating is greater than 20 dB (1001) at a wavelength of 193 nm. Differences between the calculated and experimental results are discussed.

© 2014 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(230.5440) Optical devices : Polarization-selective devices
(260.5430) Physical optics : Polarization
(220.4241) Optical design and fabrication : Nanostructure fabrication
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Diffraction and Gratings

History
Original Manuscript: December 5, 2013
Revised Manuscript: March 31, 2014
Manuscript Accepted: April 4, 2014
Published: April 30, 2014

Citation
Kosuke Asano, Satoshi Yokoyama, Atsushi Kemmochi, and Toyohiko Yatagai, "Fabrication and characterization of a deep ultraviolet wire grid polarizer with a chromium-oxide subwavelength grating," Appl. Opt. 53, 2942-2948 (2014)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-53-13-2942


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References

  1. B. W. Smith and J. Cashmore, “Challenges in high NA, polarization, and photoresist,” Proc. SPIE 4691, 11–24 (2002).
  2. G. R. Bird and M. Parrish, “The wire grid as a near-infrared polarizer,” J. Opt. Soc. Am. 50, 886–891 (1960). [CrossRef]
  3. I. Yamada, K. Takano, M. Hangyo, M. Saito, and W. Watanabe, “Terahertz wire-grid polarizers with micrometer-pitch Al gratings,” Opt. Lett. 34, 274–276 (2009). [CrossRef]
  4. H. Tamada, T. Doumuki, T. Yamaguchi, and S. Matsumoto, “Al wire-grid polarizer using the s-polarization resonance effect at the 0.8-μm-wavelength band,” Opt. Lett. 22, 419–421 (1997). [CrossRef]
  5. L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90, 063111 (2007). [CrossRef]
  6. S. W. Ahn, K. D. Lee, J. S. Kim, S. H. Kim, J. D. Park, S. H. Lee, and P. W. Yoon, “Fabrication of a 50  nm half-pitch wire grid polarizer using nanoimprint lithography,” Nanotechnology 16, 1874–1877 (2005). [CrossRef]
  7. J. M. Papalia, D. H. Adamson, P. M. Chaikin, and R. A. Register, “Silicon nanowire polarizers for far ultraviolet (sub-200  nm) applications: modeling and fabrication,” J. Appl. Phys. 107, 084305 (2010). [CrossRef]
  8. T. Weber, T. Käsebier, M. Helgert, E. B. Kley, and A. Tünnermann, “Tungsten wire grid polarizer for applications in the DUV spectral range,” Appl. Opt. 51, 3224–3227 (2012). [CrossRef]
  9. J. J. Wang, F. Walters, X. Liu, P. Sciortino, and X. Deng, “High-performance, large area, deep ultraviolet to infrared polarizers based on 40  nm line/78  nm space nanowire grids,” Appl. Phys. Lett. 90, 061104 (2007). [CrossRef]
  10. B. Schnabel, E. B. Kley, and F. Wyrowski, “Study on polarizing visible light by sub-wavelength-period metal-stripe gratings,” Opt. Eng. 38, 220–226 (1999). [CrossRef]
  11. G. Schider, J. R. Kren, W. Gotschy, B. Lamprecht, H. Ditlbacher, A. Leitner, and F. R. Aussenegg, “Optical properties of Ag and Au nanowire gratings,” J. Appl. Phys. 90, 3825–3830 (2001). [CrossRef]
  12. J. J. Wang, L. Chen, X. Liu, P. Sciortino, F. Liu, F. Walters, and X. Deng, “30-nm-wide aluminum nanowire grid for ultrahigh contrast and transmittance polarizers made by UV-nanoimprint lithography,” Appl. Phys. Lett. 89, 141105 (2006). [CrossRef]
  13. T. Weber, H. J. Fuchs, H. Schmidt, E. B. Kley, and A. Tünnermann, “Wire-grid polarizer for the UV spectral region,” Proc. SPIE 7205, 720504 (2009). [CrossRef]
  14. M. G. Moharam and T. K. Gaylord, “Rigorous coupled-wave analysis of metallic surface-relief gratings,” J. Opt. Soc. Am. A 3, 1780–1787 (1986). [CrossRef]
  15. M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, “Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach,” J. Opt. Soc. Am. A 12, 1077–1086 (1995). [CrossRef]
  16. L. Li, “Use of Fourier series in the analysis of discontinuous periodic structures,” J. Opt. Soc. Am. A 13, 1870–1876 (1996). [CrossRef]
  17. http://www.rsoftdesign.com .
  18. T. Ebihara, M. D. Levenson, W. Li, J. He, W. Yeh, S. Ahn, T. Oga, M. Shen, and H. M’saad, “Beyond k1=0.25 lithography: 70  nm L/S patterning using KrF scanners,” Proc. SPIE 5256, 985–994 (2003). [CrossRef]
  19. A. Lehmuskero, M. Kuittinen, and P. Vahimaa, “Refractive index and extinction coefficient dependence of thin Al and Ir films on deposition technique and thickness,” Opt. Express 15, 10744–10752 (2007). [CrossRef]

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