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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 13 — May. 1, 2014
  • pp: 2942–2948

Fabrication and characterization of a deep ultraviolet wire grid polarizer with a chromium-oxide subwavelength grating

Kosuke Asano, Satoshi Yokoyama, Atsushi Kemmochi, and Toyohiko Yatagai  »View Author Affiliations

Applied Optics, Vol. 53, Issue 13, pp. 2942-2948 (2014)

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A wire grid polarizer comprised of chromium oxide is designed for a micro-lithography system using an ArF excimer laser. Optical properties for some material candidates are calculated using a rigorous coupled-wave analysis. The chromium oxide wire grid polarizer with a 90 nm period is fabricated by a double-patterning technique using KrF lithography and dry etching. The extinction ratio of the grating is greater than 20 dB (1001) at a wavelength of 193 nm. Differences between the calculated and experimental results are discussed.

© 2014 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(230.5440) Optical devices : Polarization-selective devices
(260.5430) Physical optics : Polarization
(220.4241) Optical design and fabrication : Nanostructure fabrication
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Diffraction and Gratings

Original Manuscript: December 5, 2013
Revised Manuscript: March 31, 2014
Manuscript Accepted: April 4, 2014
Published: April 30, 2014

Kosuke Asano, Satoshi Yokoyama, Atsushi Kemmochi, and Toyohiko Yatagai, "Fabrication and characterization of a deep ultraviolet wire grid polarizer with a chromium-oxide subwavelength grating," Appl. Opt. 53, 2942-2948 (2014)

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