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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 17 — Jun. 10, 2014
  • pp: 3782–3786

Axial intensity distribution analysis for a depth-of-field-extended optical system using a low-frequency binary phase mask

Tingyu Zhao, Aiping Liu, Qinxiao Liu, and Feihong Yu  »View Author Affiliations


Applied Optics, Vol. 53, Issue 17, pp. 3782-3786 (2014)
http://dx.doi.org/10.1364/AO.53.003782


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Abstract

This paper theoretically analyzes the axial intensity distribution of an optical imaging system with a low-frequency binary phase mask. Based on the derivation, a novel but simple one-step phase mask is designed to extend the depth of field. A comparison is made between the novel phase mask and the one designed in previous research [Opt. Express 14, 2631 (2006)]. Both masks are numerically tested in an achromatic doublet system. The numerical results show that two phase masks have comparable performance in depth of field extension. However, the phase mask designed in this paper has a simpler structure because it has only one step while the previous one has two. Consequently, the easy fabrication of the novel phase mask leads to cost reduction. This novel low-frequency binary phase mask provides a new choice to design depth-of-field-extended optical systems without digital image processing.

© 2014 Optical Society of America

OCIS Codes
(080.2740) Geometric optics : Geometric optical design
(170.0110) Medical optics and biotechnology : Imaging systems
(220.4830) Optical design and fabrication : Systems design
(110.1085) Imaging systems : Adaptive imaging
(110.1758) Imaging systems : Computational imaging
(110.7348) Imaging systems : Wavefront encoding

ToC Category:
Imaging Systems

History
Original Manuscript: March 4, 2014
Revised Manuscript: May 5, 2014
Manuscript Accepted: May 7, 2014
Published: June 10, 2014

Citation
Tingyu Zhao, Aiping Liu, Qinxiao Liu, and Feihong Yu, "Axial intensity distribution analysis for a depth-of-field-extended optical system using a low-frequency binary phase mask," Appl. Opt. 53, 3782-3786 (2014)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-53-17-3782

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