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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 4 — Feb. 1, 2014
  • pp: A330–A333

Ion beam sputtering of fluoride thin films for 193 nm applications

Aiko Ode  »View Author Affiliations

Applied Optics, Vol. 53, Issue 4, pp. A330-A333 (2014)

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Ion beam sputtering of AlF3, LaF3, and GdF3 as single layers, AR coatings, and HR coatings for 193 nm is presented. The resulting optical properties, such as reflectance/transmittance and optical constants, and material properties, such as surface roughness and film durability, are discussed. The low temperature of the process allows for both CaF2 and fused silica substrates to be used with the same optical results.

© 2014 Optical Society of America

OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(310.6805) Thin films : Theory and design

Original Manuscript: September 4, 2013
Revised Manuscript: November 22, 2013
Manuscript Accepted: November 24, 2013
Published: January 21, 2014

Aiko Ode, "Ion beam sputtering of fluoride thin films for 193 nm applications," Appl. Opt. 53, A330-A333 (2014)

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