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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 4 — Feb. 1, 2014
  • pp: A8–A15

Reliable optical characterization of e-beam evaporated TiO2 films deposited at different substrate temperatures

T. Amotchkina, M. Trubetskov, A. Tikhonravov, I. B. Angelov, and V. Pervak  »View Author Affiliations

Applied Optics, Vol. 53, Issue 4, pp. A8-A15 (2014)

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We studied e-beam evaporated TiO 2 films deposited at two different substrate temperatures between 120°C and 300°C. We reliably characterized the film samples on the basis of in situ and ex situ measurements. We carried out annealing on the samples and studied the induced changes in the properties of the films. The results can be useful for further laser-induced damage threshold investigations.

© 2013 Optical Society of America

OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(310.7005) Thin films : Transparent conductive coatings

Original Manuscript: August 9, 2013
Revised Manuscript: September 23, 2013
Manuscript Accepted: September 24, 2013
Published: October 11, 2013

T. Amotchkina, M. Trubetskov, A. Tikhonravov, I. B. Angelov, and V. Pervak, "Reliable optical characterization of e-beam evaporated TiO2 films deposited at different substrate temperatures," Appl. Opt. 53, A8-A15 (2014)

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  1. H. K. Pulker, Coatings on Glass (Elsevier, 1999).
  2. H. A. Macleod, Thin-film Optical Filters, 4th ed. (Taylor & Francis, 2010).
  3. D. Mergel, D. Buschendorf, S. Eggert, R. Grammes, B. Samset, “Density and refractive index of TiO2 films prepared by reactive evaporation,” Thin Solid Films 371, 218–224 (2000). [CrossRef]
  4. M. Vergöhl, O. Werner, S. Bruns, “New developments in magnetron sputter processes for precision optics,” Proc. SPIE 7101, 71010B (2008). [CrossRef]
  5. B. Zhao, J. Zhou, L. Rong, “Microstructure and optical properties of TiO2 thin films deposited at different oxygen flow rates,” Trans. Nonferrous Met. Soc. China 20, 1429–1433 (2010). [CrossRef]
  6. M. M. Hasan, A. S. M. A. Haseeb, R. Saidur, H. H. Masjuki, M. Hamdi, “Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films,” Opt. Mater. 32, 690–695 (2010). [CrossRef]
  7. D. Yoo, I. Kim, S. Kim, C. H. Hahn, C. Lee, S. Cho, “Effects of annealing temperature and method on structural and optical properties of TiO2 films prepared by RF magnetron sputtering at room temperature,” Appl. Surf. Sci. 253, 3888–3892 (2007). [CrossRef]
  8. V. Mikhelashvili, G. Eisenstein, “Optical and electrical characterization of the electron beam gun evaporated TiO2 film,” Microelectron. Reliab. 41, 1057–1061 (2001). [CrossRef]
  9. H. K. Pulker, G. Paesold, E. Ritter, “Refractive indices of TiO2 films produced by reactive evaporation of various titanium-oxygen phases,” Appl. Opt. 15, 2986–2991 (1976). [CrossRef]
  10. S.-H. Woo, C. K. Hwangbo, “Effects of annealing on the optical, structural, and chemical properties of TiO2 and MgF2 thin films prepared by plasma ion-assisted deposition,” Appl. Opt. 45, 1447–1455 (2006). [CrossRef]
  11. C.-C. Lee, H.-C. Chen, C.-C. Jaing, “Investigation of thermal annealing of optical properties and residual stress of ion-beam-assisted TiO2 thin films with different substrate temperatures,” Appl. Opt. 45, 3091–3096 (2006). [CrossRef]
  12. C. Yang, H. Fan, Y. Xi, J. Chen, Z. Li, “Effects of depositing temperatures on structure and optical properties of TiO2 film deposited by ion beam assisted electron beam evaporation,” Appl. Surf. Sci. 254, 2685–2689 (2008). [CrossRef]
  13. S. Schiller, G. Beister, W. Sieber, G. Schirmer, E. Hacker, “Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering,” Thin Solid Films 83, 239–245 (1981). [CrossRef]
  14. N. Ghrairi, M. Bouaicha, “Structural, morphological, and optical properties of TiO2 thin films synthesized by the electrophoretic deposition technique,” Nanoscale Res. Lett. 7, 357–364 (2012). [CrossRef]
  15. R. Capan, N. B. Chaure, A. K. Hassan, A. K. Ray, “Optical dispersion in spun nanocrystalline titania thin films,” Semicond. Sci. Technol. 19, 198–202 (2004). [CrossRef]
  16. K. Bange, C. R. Ottermann, O. Anderson, U. Jeschkowski, M. Laube, R. Feile, “Investigations of TiO2 films deposited by different techniques,” Thin Solid Films 197, 279–285 (1991). [CrossRef]
  17. H.-C. Chen, K.-S. Lee, C.-C. Lee, “Annealing dependence of residual stress and optical properties of TiO2 thin film deposited by different deposition methods,” Appl. Opt. 47, C284–C287 (2008). [CrossRef]
  18. A. V. Tikhonravov, M. K. Trubetskov, T. V. Amotchkina, G. DeBell, V. Pervak, A. K. Sytchkova, M. L. Grilli, D. Ristau, “Optical parameters of oxide films typically used in optical coating production,” Appl. Opt. 50, C75–C85 (2011). [CrossRef]
  19. D. Reyes-Coronado, G. Rodríguez-Gattorno, M. E. Espinosa-Pesqueira, C. Cab, R. de Coss, G. Oskam, “Phase-pure TiO2 nanoparticles: anatase, brookite, and rutile,” Nanotechnology 19, 145605 (2008). [CrossRef]
  20. T. Amotchkina, M. Turowski, H. Ehlers, M. Jupé, D. Ristau, “Bandgap and refractive index of TiO2 films of different densities,” in OSA Technical Digest (OSA, 2013), paper WA.4.
  21. M. Landmann, T. Köhler, S. Köppen, E. Rauls, T. Frauenheim, W. G. Schmidt, “Fingerprints of order and disorder in the electronic and optical properties of crystalline and amorphous TiO2,” Phys. Rev. B 86, 064201 (2012). [CrossRef]
  22. H. G. Tompkins, E. A. Irene, Handbook of Ellipsometry (Springer, 2005).
  23. M. Mero, J. Liu, W. Rudolph, D. Ristau, K. Starke, “Scaling laws of femtosecond laser pulse induced breakdown in oxide films,” Phys. Rev. B 71, 115109 (2005). [CrossRef]
  24. B. Mangote, L. Gallais, M. Commandré, M. Mende, L. Jensen, H. Ehlers, M. Jupé, D. Ristau, A. Melninkaitis, J. Mirauskas, V. Sirutkaitis, S. Kičas, T. Tolenis, R. Drazdys, “Femtosecond laser damage resistance of oxide and mixture oxide optical coatings,” Opt. Lett. 37, 1478–1480 (2012). [CrossRef]
  25. I. B. Angelov, A. von Conta, S. A. Trushin, Z. Major, S. Karsch, F. Krausz, V. Pervak, “Investigation of the laser-induced damage of dispersive coatings,” Proc. SPIE 8190, 81900B (2011). [CrossRef]
  26. B. Stuart, M. Feit, S. Herman, A. Rubenchik, B. Shore, M. Perry, “Nanosecond-to-femtosecond laser-induced breakdown in dielectrics,” Phys. Rev. B 53, 1749–1761 (1996). [CrossRef]
  27. D. Ristau, H. Ehlers, T. Gross, M. Lappschies, “Optical broadband monitoring of conventional and ion processes,” Appl. Opt. 45, 1495–1501 (2006). [CrossRef]
  28. D. Poelman, P. F. Smet, “Methods for the determination of the optical constants of thin films from single transmission measurements: a critical review,” J. Appl. Phys. 36, 1850–1857 (2003).
  29. A. Tikhonravov, M. Trubetskov, G. DeBell, “On the accuracy of optical thin film parameter determination based on spectrophotometric data,” Proc. SPIE 5188, 190–199 (2003). [CrossRef]
  30. D. A. G. Bruggeman, “Berechnung verschiedener physikalischer Konstanten von heterogenen Substanzen. I. Dielektrizitätskonstanten und Leitfähigkeiten der Mischkörper aus isotropen Substanzen,” Ann. Phys. 416, 636–664 (1935). [CrossRef]
  31. J. Tauc, R. Grigorovici, A. Vancu, “Optical properties and electronic structure of amorphous germanium,” Phys. Status Solidi B 15, 627–637 (1966). [CrossRef]
  32. L.-J. Meng, M. P. dos Santos, “Investigations of titanium oxide films deposited by d.c. reactive magnetron sputtering in different sputtering pressures,” Thin Solid Films 226, 22–29 (1993). [CrossRef]
  33. I. B. Lucy, J. Beynon, D. N. Waters, “Optical properties of co-evaporated Cu-GeO2 thin cermet films,” J. Mater. Sci. Lett. 15, 515–518 (1996).
  34. S. Valencia, J. M. Marín, G. Restrepo, “Study of the bandgap of synthesized titanium dioxide nanoparticules using the sol-gel method and a hydrothermal treatment,” Open Mater. Sci. J. 4, 9–14 (2010). [CrossRef]
  35. M. Sreemany, S. Sen, “A simple spectrophotometric method for determination of the optical constants and band gap energy of multiple layer TiO2 thin films,” Mater. Chem. Phys. 83, 169–177 (2004). [CrossRef]
  36. J. Aarik, A. Aidla, A.-A. Kiisler, T. Uustare, V. Sammelselg, “Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition,” Thin Solid Films 305, 270–273 (1997). [CrossRef]
  37. O. Stenzel, The Physics of Thin Film Optical Spectra: An Introduction, Vol. 44 of Springer Series in Surface Sciences (Springer, 2005).

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