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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 53, Iss. 4 — Feb. 1, 2014
  • pp: A8–A15

Reliable optical characterization of e-beam evaporated TiO2 films deposited at different substrate temperatures

T. Amotchkina, M. Trubetskov, A. Tikhonravov, I. B. Angelov, and V. Pervak  »View Author Affiliations


Applied Optics, Vol. 53, Issue 4, pp. A8-A15 (2014)
http://dx.doi.org/10.1364/AO.53.0000A8


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Abstract

We studied e-beam evaporated TiO 2 films deposited at two different substrate temperatures between 120°C and 300°C. We reliably characterized the film samples on the basis of in situ and ex situ measurements. We carried out annealing on the samples and studied the induced changes in the properties of the films. The results can be useful for further laser-induced damage threshold investigations.

© 2013 Optical Society of America

OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(310.7005) Thin films : Transparent conductive coatings

History
Original Manuscript: August 9, 2013
Revised Manuscript: September 23, 2013
Manuscript Accepted: September 24, 2013
Published: October 11, 2013

Citation
T. Amotchkina, M. Trubetskov, A. Tikhonravov, I. B. Angelov, and V. Pervak, "Reliable optical characterization of e-beam evaporated TiO2 films deposited at different substrate temperatures," Appl. Opt. 53, A8-A15 (2014)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-53-4-A8


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