The design of a grid polarizer is discussed and the effect of supporting it on various substrates is evaluated using a transmission line analogy. A method of making such a grid polarizer by photolithographic techniques is described, and measurements on a device suitable for use at wavelengths between 20 μ and several hundred microns are presented. Their performance compares favorably with polarizers made by other methods.
© 1967 Optical Society of America
Original Manuscript: January 16, 1967
Published: June 1, 1967
J. P. Auton, "Infrared Transmission Polarizers by Photolithography," Appl. Opt. 6, 1023-1027 (1967)