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Applied Optics

Applied Optics


  • Vol. 7, Iss. 11 — Nov. 1, 1968
  • pp: 2315–2317

A Measuring Interferometer for High Accuracy Alignment

Robert O. Naess  »View Author Affiliations

Applied Optics, Vol. 7, Issue 11, pp. 2315-2317 (1968)

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An interferometer is described that is capable of measuring the deviation of a target device from a plane with an accuracy of 0.1 μ, when the interferometer–target separation is as much as 10 m. This interferometer resembles one described in 1965 by Baldwin and Whitten in that they both use a Kösters prism and a Porro prism. The present use of a laser for the light source yields nonlocalized fringes at the output that are easily monitored by an electronic fringe detector.

© 1968 Optical Society of America

Original Manuscript: February 19, 1968
Published: November 1, 1968

Robert O. Naess, "A Measuring Interferometer for High Accuracy Alignment," Appl. Opt. 7, 2315-2317 (1968)

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  1. P. Kissam, Optical Tooling (McGraw-Hill Book Co., Inc., New York, 1962), Ch. 6, 7, and 8.
  2. A. C. S. van Heel, Progress in Optics (John Wiley & Sons, Inc., New York, 1961), Vol. 1, pp. 289–329. [CrossRef]
  3. J. Dyson, in Optics in Metrology, P. Mollet, Ed. (Pergamon Press, Ltd., London, 1960), pp. 169–171.
  4. J. H. MacLeod, J. Opt. Soc. Amer. 44, 595 (1954).
  5. J. B. Saunders, J. Res. Nat. Bur. Stand. (U.S.) 58, 21 (1957). [CrossRef]
  6. R. R. Baldwin, L. G. Whitten, Alignment Interferometer (ASME), paper 64–WA/PROD–5 (1964).
  7. R. R. Baldwin, L. G. Whitten, “Principles and Operation of the Alignment Interferometer” (Union Carbide Corp., Oak Ridge, Tennessee), Rep. Y–1489.

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