Capacitive grids and similar structures, to be used as reflectors in far ir interference filters, are prepared from a 1-μ thick copper layer supported by a 2.5-μ thick dielectric film. The desired pattern is obtained by simple photolithographic contact printing of a suitable negative. The essential steps of this preparation and the generation of some relevant patterns are described.
© 1969 Optical Society of America
Original Manuscript: September 3, 1968
Published: February 1, 1969
Reinhard Ulrich, "Preparation of Grids for Far Infrared Filters," Appl. Opt. 8, 319-322 (1969)