A technique is described for recording holograms and forming diffraction gratings in Shipley AZ1350 photoresist using the 4579-Å output from an argon laser. A pre-exposure technique is described that not only reduces exposure times but increases the signal-to-noise ratio of the image. It is also shown that the effects of the variable characteristic of the resist can be alleviated by monitoring diffraction efficiency during development.
M. J. Beesley and J. G. Castledine, "The Use of Photoresist as a Holographic Recording Medium," Appl. Opt. 9, 2720-2724 (1970)