A technique is described for recording holograms and forming diffraction gratings in Shipley AZ1350 photoresist using the 4579-Å output from an argon laser. A pre-exposure technique is described that not only reduces exposure times but increases the signal-to-noise ratio of the image. It is also shown that the effects of the variable characteristic of the resist can be alleviated by monitoring diffraction efficiency during development.
© 1970 Optical Society of America
Original Manuscript: March 20, 1970
Published: December 1, 1970
M. J. Beesley and J. G. Castledine, "The Use of Photoresist as a Holographic Recording Medium," Appl. Opt. 9, 2720-2724 (1970)