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Applied Optics

Applied Optics


  • Vol. 9, Iss. 12 — Dec. 1, 1970
  • pp: 2720–2724

The Use of Photoresist as a Holographic Recording Medium

M. J. Beesley and J. G. Castledine  »View Author Affiliations

Applied Optics, Vol. 9, Issue 12, pp. 2720-2724 (1970)

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A technique is described for recording holograms and forming diffraction gratings in Shipley AZ1350 photoresist using the 4579-Å output from an argon laser. A pre-exposure technique is described that not only reduces exposure times but increases the signal-to-noise ratio of the image. It is also shown that the effects of the variable characteristic of the resist can be alleviated by monitoring diffraction efficiency during development.

© 1970 Optical Society of America

Original Manuscript: March 20, 1970
Published: December 1, 1970

M. J. Beesley and J. G. Castledine, "The Use of Photoresist as a Holographic Recording Medium," Appl. Opt. 9, 2720-2724 (1970)

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  1. N. K. Sheridan, Appl. Phys. Lett. 12, 3 (1968). [CrossRef]
  2. H. J. Gerritsen, W. J. Hannan, E. G. Ramberg., Appl. Opt. 7, 11 (1968). [CrossRef]
  3. A. Labeyrie, J. Flamand, Opt. Commun. 1, 1 (1969). [CrossRef]
  4. M. J. Beesley, H. Foster, K. G. Hambleton, Electron. Lett. 4, 3 (1968). [CrossRef]
  5. M. J. Beesley, J. G. Catledine, D. P. Cooper, Electron. Lett. 5, 12, 1969.
  6. H. Kogelnik, in Modern Optics, J. Fox, Ed. (Polytechnic Press, Brooklyn, 1967).

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