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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 9, Iss. 3 — Mar. 1, 1970
  • pp: 533–537

Analysis of Perturbed Lens Systems

M. Rimmer  »View Author Affiliations


Applied Optics, Vol. 9, Issue 3, pp. 533-537 (1970)
http://dx.doi.org/10.1364/AO.9.000533


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Abstract

In tolerancing a lens system, it is necessary to know the effects of fabrication and alignment errors on the image quality. In this report, the wavefront aberration due to a small parameter perturbation is derived. This may be calculated from ray tracing through the nominal system only, and its linearity is extremely useful for tolerancing. The results are applied to the calculation of the variance, or rms, of the wavefront as a tolerancing criterion.

© 1970 Optical Society of America

History
Original Manuscript: June 10, 1969
Published: March 1, 1970

Citation
M. Rimmer, "Analysis of Perturbed Lens Systems," Appl. Opt. 9, 533-537 (1970)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-9-3-533


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References

  1. A. Maréchal, thesis, University of Paris (1948).
  2. H. H. Hopkins, Opt. Acta 13, 343 (1966). [CrossRef]
  3. H. H. Hopkins, H. J. Tiziani, Brit. J. Appl. Phys. 17, 33 (1966). [CrossRef]
  4. H. H. Hopkins, Proc. Phys. Soc. (London) B22, 449 (1957).
  5. W. B. King, Appl. Opt. 7, 489 (1968). [CrossRef] [PubMed]
  6. W. B. King. Appl. Opt. 7, 1193 (1968). [CrossRef] [PubMed]

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