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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 9, Iss. 4 — Apr. 1, 1970
  • pp: 871–874

Method of Measuring Diffuse RMS Granularity

H. C. Schmitt, Jr. and J. H. Altman  »View Author Affiliations


Applied Optics, Vol. 9, Issue 4, pp. 871-874 (1970)
http://dx.doi.org/10.1364/AO.9.000871


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Abstract

The rms granularity values normally produced by an optical scanner are in terms of semispecular instrument density. It is shown that these semispecular values can be converted to a diffuse density basis by dividing by a quantity q that is defined as the ratio of the instrument density of the sample to the diffuse density. The q factor has been measured by two methods, one of which is convenient for use in the routine measurement of diffuse granularity with existing equipment. It has been found that, except at very low density levels, the q of a given material varies only slightly as the diffuse density changes. It does, however, increase significantly as the numerical aperture of the optical system decreases. When a range of samples is measured, maximum values of q occur at moderate values of sample granularity.

© 1970 Optical Society of America

History
Original Manuscript: May 24, 1969
Published: April 1, 1970

Citation
H. C. Schmitt and J. H. Altman, "Method of Measuring Diffuse RMS Granularity," Appl. Opt. 9, 871-874 (1970)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-9-4-871


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References

  1. J. H. Altman, Appl. Opt. 3, 35 (1964). [CrossRef]
  2. C. S. McCamy, Phot. Sci. Eng. 10, 314 (1966).
  3. C. Tuttle, J. W. McFarlane, J. Soc. Motion Picture Television Engrs. 15, 345 (1930).
  4. G. A. Boutry, in Proceedings of the Ninth International Photographic Congress (Editions Rev. d’Optique, Paris, 1936), p. 484.
  5. C. E. K. Mees, The Theory of the Photographic Process (Macmillan Book Company, New York, 1942), pp. 850–851.

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