Introduction to special issue of Applied Optics on soft-x-ray projection lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6895–6896 (1993)
• William T. Silfvast and Natale M. Ceglio

X-ray production ˜ 13 nm from laser-produced plasmas for projection x-ray lithography applications

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6897–6900 (1993)
• R. L. Kauffman, D. W. Phillion, and R. C. Spitzer

Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6901–6910 (1993)
• Martin Richardson, William T. Silfvast, Howard A. Bender, Art Hanzo, Victor P. Yanovsky, Feng Jin, and Jerry Thorpe

X-ray plasma source design simulations

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6911–6913 (1993)
• Charles Cerjan

Laser driver for soft-x-ray projection lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6914–6919 (1993)
• Lloyd A. Hackel, Raymond J. Beach, C. Brent Dane, and Luis E. Zapata

Synchrotron radiation sources and condensers for projection x-ray lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6920–6929 (1993)
• J. B. Murphy, D. L. White, Alastair A. MacDowell, and Obert R. Wood II

Continuous emission source covering the 50-300-Å band

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6930–6933 (1993)
• Stuart Bowyer

Prototype high-speed tape target transport for a laser plasma soft-x-ray projection lithography source

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6934–6937 (1993)
• Steven J. Haney, Kurt W. Berger, Glenn D. Kubiak, Paul D. Rockett, and John Hunter

Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6938–6944 (1993)
• Gary E. Sommargren and Lynn G. Seppala

Physical optics modeling in soft-x-ray projection lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6945–6951 (1993)
• William C. Sweatt and George N. Lawrence

Multilayer mirror technology for soft-x-ray projection lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6952–6960 (1993)
• D. G. Stearns, R. S. Rosen, and S. P. Vernon

Masked deposition techniques for achieving multilayer period variations required for short-wavelength (68-Å) soft-x-ray imaging optics

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6961–6968 (1993)
• J. B. Kortright, E. M. Gullikson, and P. E. Denham

Ion-assisted sputter deposition of molybdenum-silicon multilayers

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6969–6974 (1993)
• Stephen P. Vernon, Daniel G. Stearns, and Robert S. Rosen

Silicide layer growth rates in Mo/Si multilayers

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6975–6980 (1993)
• Robert S. Rosen, Daniel Stephen P. Vernon, G. Stearns, Michael A. Viliardos, Michael E. Kassner, and Yuanda Cheng

Influence of electrical isolation on the structure and reflectivity of multilayer coatings deposited on dielectric substrates

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6981–6984 (1993)
• Georgy Gutman, John Keem, Jim Wood, Charles Tarrio, and Richard Watts

Tarnishing of Mo/Si multilayer x-ray mirrors

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 6985–6990 (1993)
• J. H. Underwood, E. M. Gullikson, and Khanh Nguyen

Radiation hardness of molybdenum silicon multilayers designed for use in a soft-x-ray projection lithography system

• Abstract
•  | Full Text: PDF (1013 KB)

• Applied Optics, Vol. 32, Iss. 34, pp. 6991–6998 (1993)
• David P. Gaines, Ronnie C. Spitzer, Natale M. Ceglio, Michael Krumrey, and Gerhard Ulm

Investigation of distortion and damage of molybdenum†silicon multilayer reflective coatings with high-intensity ultraviolet radiation

• Abstract
•  | Full Text: PDF (1992 KB)

• Applied Optics, Vol. 32, Iss. 34, pp. 6999–7006 (1993)
• Howard A. Bender, William T. Silfvast, Kenneth M. Beck, and Rajiv K. Singh

Mask technologies for soft-x-ray projection lithography at 13 nm

• Abstract
•  | Full Text: PDF (2052 KB)

• Applied Optics, Vol. 32, Iss. 34, pp. 7007–7011 (1993)
• D. M. Tennant, L. A. Fetter, L. R. Harriott, A. A. MacDowell, P. P. Mulgrew, J. Z. Pastalan, W. K. Waskiewicz, D. L. Windt, and O. R. Wood II

Reflection mask defect repair

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7012–7015 (1993)
• Andrew M. Hawryluk and Diane Stewart

Propagation errors in precision Fizeau interferometry

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7016–7021 (1993)
• Chunsheng Huang

Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7022–7031 (1993)
• David Attwood, Gary Sommargren, Raul Beguiristain, Khanh Nguyen, Jeffrey Bokor, Natale Ceglio, Keith Jackson, Masato Koike, and James Underwood

Resist alternatives for sub-0.35-µm lithography by using highly attenuated radiation

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7032–7035 (1993)
• R. R. Kunz, M. A. Hartney, and M. Rothschild

Chemically amplified soft-x-ray resists: sensitivity, resolution, and molecular photodesorption

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7036–7043 (1993)
• Glenn D. Kubiak, Robert Q. Hwang, Michelle T. Schulberg, Daniel A. Tichenor, and Kathleen Early

Characterization of AZ PN114 resist for soft-x-ray projection lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7044–7049 (1993)
• K. Early, D. M. Tennant, D. Y. Jeon, P. P. Mulgrew, A. A. MacDowell, O. R. Wood II, G. D. Kubiak, and D. A. Tichenor

Front-end design issues in soft-x-ray projection lithography

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7050–7056 (1993)
• Natale M. Ceglio, Andrew M. Hawryluk, and Gary E. Sommargren

Schwarzschild microscope for carbon Kα radiation

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7057–7061 (1993)
• Katsuhiko Murakami, Tetsuya Oshino, Hiroshi Nakamura, Masayuki Ohtani, and Hiroshi Nagata

Wavelength considerations in soft-x-ray projection lithography

• Abstract
•  | Full Text: PDF (686 KB)

• Applied Optics, Vol. 32, Iss. 34, pp. 7062–7067 (1993)
• Andrew M. Hawryluk and Natale M. Ceglio

Soft-x-ray projection lithography experiments using Schwarzschild imaging optics

• Abstract
•  | Full Text: PDF (770 KB)

• Applied Optics, Vol. 32, Iss. 34, pp. 7068–7071 (1993)
• D. A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, L. A. Brown, W. C. Sweatt, J. E. Bjorkholm, R. R. Freeman, M. D. Himel, A. A. MacDowell, D. M. Tennant, 0. R. Wood 11, J. Bokor, T. E. Jewell, W. M. Mansfield, W. K. Waskiewicz, D. L. White, and D. L. Windt

Soft-x-ray projection imaging with a 1:1 ring-field optic

• Abstract
•  | Full Text: PDF (3044 KB)

• Applied Optics, Vol. 32, Iss. 34, pp. 7072–7078 (1993)
• A. A. MacDowell, J. E. Bjorkholm, K. Early, R. R. Freeman, M. D. Himel, P. P. Mulgrew, L. H. Szeto, D. W. Taylor, D. M. Tennant, O. R. Wood II, J. Bokor, L. Eichner, T. E. Jewell, W. K. Waskiewicz, D. L. White, D. L. Windt, R. M. D'Souza, W. T. Silfvast, and F. Zernike

Large-area, high-resolution pattern replication by the use of a two-aspherical-mirror system

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7079–7083 (1993)
• H. Kinoshita, K. Kurihara, T. Mizota, T. Haga, H. Takenaka, and Y. Torii

Possible damage mechanism of the dielectric coatings for a KrF laser

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7084–7085 (1993)
• H. L. Gao and N. Y. Wang

Transverse color tolerances for visual optical systems

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• Applied Optics, Vol. 32, Iss. 34, pp. 7089–7094 (1993)
• Pantazis Mouroulis, Taek Gyu Kim, and Guoheng Zhao

Hadamard spectroscopy with a two-dimensional detecting array

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7095–7105 (1993)
• S. B. Mende, E. S. Claflin, R. L. Rairden, and G. R. Swenson

Optical and crystalline properties of PbF₂ thin films

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7106–7109 (1993)
• Márcia A. F. Destro, Roberto A. Stempniak, and Alvaro J. Damião

Prototype fiber-optic-based pressure probe with built-in temperature compensation with signal recovery by coherence reading

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7110–7113 (1993)
• Y. J. Rao and D. A. Jackson

Infrared Collimator System

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7117–7118 (1993)
• David Shafer

Rotational Shearing Interferometer

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7118–7119 (1993)
• Berton C. Willard

Accurate Measurement of Refractive Indices

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7120–7121 (1993)
• Hsiung Hsu

Fiber-coupled Laser Diode Mount for Interferometry

• Abstract
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• Applied Optics, Vol. 32, Iss. 34, pp. 7122–7123 (1993)
• Peter de Groot

Estimating Secondary Color

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• Applied Optics, Vol. 32, Iss. 34, pp. 7124–7124 (1993)
• Bruce H. Walker