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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: James C. Wyant
  • Vol. 45, Iss. 32 — Nov. 10, 2006
  • pp: 8177–8380

Optics InfoBase > Applied Optics > Volume 45 > Issue 32 > Table of Contents

Topics in this Issue

 
  • Diffraction and Gratings
  • Fiber Optics and Optical Communications
  • Fourier Optics and Optical Signal Processing
  • Geometric Optics
  • Imaging Systems
  • Instrumentation, Measurement, and Metrology
  • Interferometry
  • Lasers and Laser Optics
  • Materials
  • Medical Optics and Biotechnology
  • Optical Design and Fabrication
  • Optical Devices
  • Optics at Surfaces
  • Optoelectronics
  • Remote Sensing
  • Spectroscopy
  • Ultrafast Optics
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Optical Technology

Diffraction and Gratings

  • Applied Optics Vol. 45, Iss. 32, pp. 8177–8185 (2006)
  • Jed Khoury, Bahareh Haji-saeed, Christian P. Morath, Charles L. Woods, Sandip K. Sengupta, and John Kierstead

  • Applied Optics Vol. 45, Iss. 32, pp. 8186–8193 (2006)
  • V. Beugin, L. Bigot, P. Niay, M. Lancry, Y. Quiquempois, M. Douay, G. Mélin, A. Fleureau, S. Lempereur, and L. Gasca

Fiber Optics and Optical Communications

  • Applied Optics Vol. 45, Iss. 32, pp. 8194–8196 (2006)
  • T. Abrahamyan, E. Janunts, and Kh. Nerkararyan

Geometric Optics

  • Applied Optics Vol. 45, Iss. 32, pp. 8197–8199 (2006)
  • G. Veshapidze, M. L. Trachy, M. H. Shah, and B. D. DePaola

Imaging Systems

  • Applied Optics Vol. 45, Iss. 32, pp. 8200–8208 (2006)
  • Mingying Ma, Xiangzhao Wang, and Fan Wang

  • Applied Optics Vol. 45, Iss. 32, pp. 8209–8217 (2006)
  • Frédéric Montfort, Tristan Colomb, Florian Charrière, Jonas Kühn, Pierre Marquet, Etienne Cuche, Sylvain Herminjard, and Christian Depeursinge

Instrumentation, Measurement, and Metrology

  • Applied Optics Vol. 45, Iss. 32, pp. 8218–8237 (2006)
  • Steven W. Brown, George P. Eppeldauer, and Keith R. Lykke

Interferometry

  • Applied Optics Vol. 45, Iss. 32, pp. 8238–8243 (2006)
  • Tae-Jung Ahn, Sucbei Moon, Soan Kim, Kyunghwan Oh, Dug Young Kim, Jens Kobelke, Kay Schuster, and Johnnes Kirchhof

  • Applied Optics Vol. 45, Iss. 32, pp. 8244–8252 (2006)
  • Evangelos Papastathopoulos, Klaus Körner, and Wolfgang Osten

Lasers and Laser Optics

  • Applied Optics Vol. 45, Iss. 32, pp. 8253–8261 (2006)
  • ZhiLin Xia, JianDa Shao, ZhengXiu Fan, and ShiGang Wu

Materials

  • Applied Optics Vol. 45, Iss. 32, pp. 8262–8272 (2006)
  • Marek Izdebski

Optical Design and Fabrication

  • Applied Optics Vol. 45, Iss. 32, pp. 8273–8277 (2006)
  • Chih-Chao Yang, Yun-Hsun Huang, Te-Chin Peng, Meng-Chyi Wu, Chong-Long Ho, Chao-Chi Hong, I-Ming Liu, and Yao-Tsong Tsai

  • Applied Optics Vol. 45, Iss. 32, pp. 8278–8287 (2006)
  • Cheng-Wei Chien, Jyh-Chen Chen, and Ju-Yi Lee

Optical Devices

  • Applied Optics Vol. 45, Iss. 32, pp. 8288–8297 (2006)
  • Peter Kurczynski, Harold M. Dyson, and Bernard Sadoulet

Optics at Surfaces

  • Applied Optics Vol. 45, Iss. 32, pp. 8298–8303 (2006)
  • Kevin Robbie, Yan Cui, Chelsea Elliott, and Kate Kaminska

Optoelectronics

  • Applied Optics Vol. 45, Iss. 32, pp. 8304–8307 (2006)
  • Wei-Ching Chuang, Chi-Ting Ho, and Wen-Chung Chang

Spectroscopy

  • Applied Optics Vol. 45, Iss. 32, pp. 8308–8314 (2006)
  • C. H. Chuang and Y. L. Lo

Information Processing

Fourier Optics and Optical Signal Processing

  • Applied Optics Vol. 45, Iss. 32, pp. 8315–8321 (2006)
  • Caijie Yan and Weimin Jin

Instrumentation, Measurement, and Metrology

  • Applied Optics Vol. 45, Iss. 32, pp. 8322–8330 (2006)
  • T. M. Niebauer, A. Schiel, and D. van Westrum

Lasers, Photonics, and Environmental Optics

Instrumentation, Measurement, and Metrology

  • Applied Optics Vol. 45, Iss. 32, pp. 8331–8337 (2006)
  • Daniel Daugeron, Jean-Baptiste Renard, Bertrand Gaubicher, Benoît Couté, Edith Hadamcik, François Gensdarmes, Guillaume Basso, and Corinne Fournier

Lasers and Laser Optics

  • Applied Optics Vol. 45, Iss. 32, pp. 8338–8345 (2006)
  • Yujin Chen, Xinghong Gong, Yanfu Lin, Qiguang Tan, Zundu Luo, and Yidong Huang

Remote Sensing

  • Applied Optics Vol. 45, Iss. 32, pp. 8346–8349 (2006)
  • Jyi-Lai Shen and Rainer Künnemeyer

Ultrafast Optics

  • Applied Optics Vol. 45, Iss. 32, pp. 8350–8353 (2006)
  • Zenghu Chang

  • Applied Optics Vol. 45, Iss. 32, pp. 8354–8359 (2006)
  • Mateusz Plewicki, Fabian Weise, Stefan M. Weber, and Albrecht Lindinger

Biomedical Optics

Medical Optics and Biotechnology

  • Applied Optics Vol. 45, Iss. 32, pp. 8360–8365 (2006)
  • Xiaoping Liang, Qizhi Zhang, and Huabei Jiang

  • Applied Optics Vol. 45, Iss. 32, pp. 8366–8373 (2006)
  • Jianwei Qin and Renfu Lu

  • Applied Optics Vol. 45, Iss. 32, pp. 8374–8380 (2006)
  • Sangjoon Hahn and Gilwon Yoon
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The ZEMAX simulation of the digital micromirror device (DMD) in the new digital programmable light spectrum synthesis system is shown. It has an infrared C-band Gaussian spectrum distribution with three different wavelengths. The DMD chip is tilted at an angle of 57 degrees about the light axis. The micromirrors at either end of the DMD chip are set to the -12 degrees state (i.e., the OFF state), causing the incident light to be reflected through an angle of 90 degrees. Meanwhile, the micromirrors in the central region of the DMD are set to the 12 degrees state (i.e., the ON state), causing the incident light to be reflected at an angle of 42 degrees. For more details, see the paper by Chuang and Lo, pp. 8308-8314.

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