Abstract

A method is described whereby the relative radiative fluxes of analytical lines of lead, silver, and copper and a background monitoring wavelength were measured simultaneously. These and the background 0.1 nm from the analytical lines on both sides thereof were measured sequentially. A digital photoelectrical detection system was employed. The same detector channels were used for the line intensity and the adjacent background measurements. The technique for background correction with measurements near the analytical lines was compared with the method of using the common monitor wavelength region some distance away from the analytical lines. A nitrous oxide-acetylene flame was used. The interference of calcium and potassium in the sample matrix on lead determinations in flame emission was shown to be caused by indirect spectral background interference and ionization interference affecting the line intensity. Ionization interference in the case of silver and copper was also detected.

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