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Optica Publishing Group
  • Applied Spectroscopy
  • Vol. 35,
  • Issue 1,
  • pp. 130-131
  • (1981)

Excitation of C3πu State of N2 in a Radio-frequency Glow Discharge

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Abstract

Radio-frequency plasmas are now widely used for material processing in the semiconductor industry. Like many technical developments, the empirical process development has preceded a thorough understanding of the physical or chemical processes occurring in these systems. Optical spectroscopy provides an excellent probe of the processes occurring in these glow discharge systems.

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