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Applied Spectroscopy

Applied Spectroscopy


  • Vol. 40, Iss. 7 — Sep. 1, 1986
  • pp: 1074–1075

Organic Solvents and the Argon Inductively Coupled Plasma

D. D. Nygaard, R. G. Schleicher, and J. J. Sotera

Applied Spectroscopy, Vol. 40, Issue 7, pp. 1074-1075 (1986)

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Tolerance of the low power (2 kW nominal power at 27.12 MHz) argon inductively coupled plasma (ICP) to common organic solvents has been described in two papers published in 1982. The work by Miyazaki et al. qualitatively classified organic solvents as very easy, easy, difficult, or impossible to analyze by aspiration into a 1.6-kW argon ICP. The work by Boorn and Browner semiquantitatively listed organic solvents according to the maximum aspiration rate at which a stable argon ICP could be maintained at 1.75 kW power. The two classification schemes are in general agreement concerning the most troublesome organic solvents. However, rf generator design has become less homogeneous since 1982, and, consequently, the degree-of-difficulty ratings established at that time may no longer be appropriate to the diversity of rf generators available on modern instrumentation. This work reexamines argon ICP tolerance to the most troublesome organic solvents using a newly designed rf generator.

D. D. Nygaard, R. G. Schleicher, and J. J. Sotera, "Organic Solvents and the Argon Inductively Coupled Plasma," Appl. Spectrosc. 40, 1074-1075 (1986)

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