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Applied Spectroscopy

Applied Spectroscopy

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  • Vol. 46, Iss. 1 — Jan. 1, 1992
  • pp: 156–158

Polarization-Modulation Emission FT-IR Measurement of Thin Organic Films on Metal Surfaces

Kenji Tochigi, Hideto Momose, Yutaka Misawa, and Takaya Suzuki

Applied Spectroscopy, Vol. 46, Issue 1, pp. 156-158 (1992)


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Abstract

A polarization-modulation technique has been combined with Fourier transform infrared (FT-IR) spectrometry to eliminate the large background radiation which interferes with the infrared emission from thin organic films on metal surfaces. A step scan and a continuous scan interferometer which were combined with a photoelastic modulator were also studied, and the step scan system was found to be stabler and have a better S/N. The spectrum of a 12-nm perfluoropolyether film was obtained at 120°C by this system.

Citation
Kenji Tochigi, Hideto Momose, Yutaka Misawa, and Takaya Suzuki, "Polarization-Modulation Emission FT-IR Measurement of Thin Organic Films on Metal Surfaces," Appl. Spectrosc. 46, 156-158 (1992)
http://www.opticsinfobase.org/as/abstract.cfm?URI=as-46-1-156


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