Abstract
Conventional HfO2/SiO2 and
Al2O3/HfO2/SiO2 double stack high reflective
(HR) coatings at 532 nm are deposited by electron beam evaporation onto BK7
substrates. The laser-induced damage threshold (LIDT) of two kinds of HR coatings is
tested, showing that the laser damage resistance of the double stack HR coatings (16
J/cm2) is better than that of the conventional HR coatings (12.8 J/cm2). Besides,
the optical properties, surface conditions, and damage morphologies of each group
samples are characterized. The results show that laser damage resistance of
conventional HR coatings is determined by absorptive defect, while nodular defect is
responsible for the LIDT of double stack HR coatings.
© 2014 Chinese Optics Letters
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