OSA's Digital Library

Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. 2 — Feb. 10, 2005
  • pp: 73–75

Simulation study of the NA?'s dependence of DOF for 193-nm immersion lithography at 65-nm node

Guosheng Huang and Yanqiu Li  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue 2, pp. 73-75 (2005)


View Full Text Article

Acrobat PDF (353 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations
  • Export Citation/Save Click for help

Abstract

Recently, ArF immersion lithography has been considered as a promising method after ArF dry lithography by a factor of refractive index n of the liquid filled into the space between the bottom lens and wafer, in the case of 193-nm exposure tools, water (n = 1.44) has been found as the best liquid. We explore the NA?'s dependence of depth of focus (DOF) under 3/4 annular and 3/4 quasar illumination by resist imaging simulation. Line/space pairs of line-to-space ratios 1:1, 1:2, 1:4 on binary mask are considered. Finally, we explored the high NA's dependency of DOF and gave the explanation for the peak value of DOF through three-beam imaging process, MicroCruiser 2.0, Prolith version 8.0.2 and k_2 factor based on the Rayleigh equation.

© 2005 Chinese Optics Letters

OCIS Codes
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(110.5220) Imaging systems : Photolithography
(220.4830) Optical design and fabrication : Systems design
(230.0230) Optical devices : Optical devices

Citation
Guosheng Huang and Yanqiu Li, "Simulation study of the NA?'s dependence of DOF for 193-nm immersion lithography at 65-nm node," Chin. Opt. Lett. 3, 73-75 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-2-73


Sort:  Author  |  Year  |  Journal  |  Reset

References

  1. S. Owa and H. Nagasaka, Journal of Microlithography, Microfabrication, and Microsystems 3, 97 (2004).
  2. J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).
  3. C. A. Mack, Inside PROLITH^(TM), A Comprehensive Guide to Optical Lithography Simulation (FINLE Technologies, Inc., Austin, Texas, USA, 1997).
  4. S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

Cited By

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited