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Chinese Optics Letters

Chinese Optics Letters


  • Vol. 3, Iss. 2 — Feb. 10, 2005
  • pp: 73–75

Simulation study of the NA?'s dependence of DOF for 193-nm immersion lithography at 65-nm node

Guosheng Huang and Yanqiu Li  »View Author Affiliations

Chinese Optics Letters, Vol. 3, Issue 2, pp. 73-75 (2005)

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Recently, ArF immersion lithography has been considered as a promising method after ArF dry lithography by a factor of refractive index n of the liquid filled into the space between the bottom lens and wafer, in the case of 193-nm exposure tools, water (n = 1.44) has been found as the best liquid. We explore the NA?'s dependence of depth of focus (DOF) under 3/4 annular and 3/4 quasar illumination by resist imaging simulation. Line/space pairs of line-to-space ratios 1:1, 1:2, 1:4 on binary mask are considered. Finally, we explored the high NA's dependency of DOF and gave the explanation for the peak value of DOF through three-beam imaging process, MicroCruiser 2.0, Prolith version 8.0.2 and k_2 factor based on the Rayleigh equation.

© 2005 Chinese Optics Letters

OCIS Codes
(070.2580) Fourier optics and signal processing : Paraxial wave optics
(110.5220) Imaging systems : Photolithography
(220.4830) Optical design and fabrication : Systems design
(230.0230) Optical devices : Optical devices

Guosheng Huang and Yanqiu Li, "Simulation study of the NA?'s dependence of DOF for 193-nm immersion lithography at 65-nm node," Chin. Opt. Lett. 3, 73-75 (2005)

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  1. S. Owa and H. Nagasaka, Journal of Microlithography, Microfabrication, and Microsystems 3, 97 (2004).
  2. J. Mulkens, D. Flagello, B. Streefkerk, and P. Grapner, Journal of Microlithography, Microfabrication, and Microsystems 3, 104 (2004).
  3. C. A. Mack, Inside PROLITH^(TM), A Comprehensive Guide to Optical Lithography Simulation (FINLE Technologies, Inc., Austin, Texas, USA, 1997).
  4. S. D. Hsu, N. Corcoran, M. Eurlings, W. Knose, T. Laidig, K. E. Wampler, S. Roy, X. Shi, M. Hsu, J. Fungchen, J. Finders, R. J. Socha, and M. Dusa, Proc. SPIE 4691, 476 (2002).

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