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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. 3 — Mar. 10, 2005
  • pp: 181–183

Laser induced damage of multi-layer dielectric used in pulse compressor gratings

Weijin Kong, Yuanan Zhao, Tao Wang, Jianda Shao, and Zhengxiu Fan  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue 3, pp. 181-183 (2005)


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Abstract

Laser induced damage threshold (LIDT) of multi-layer dielectric used in pulse compressor gratings (PCG) was investigated. The sample was prepared by e-beam evaporation (EBE). LIDT was detected following ISO standard 11254-1.2. It was found that LIDTs of normal and 51.2 deg. incidence (transverse electric (TE) mode) were 14.14 and 9.31 J/cm2, respectively. A Nomarski microscope was employed to map the damage morphology, and it was found that the damage behavior was pit-concave-plat structure for normal incidence, while it was pit structure for 51.2 deg. incidence with TE mode. The electric field distribution was calculated to illuminate the difference of LIDT between the two incident cases.

© 2005 Chinese Optics Letters

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(230.1950) Optical devices : Diffraction gratings
(310.6860) Thin films : Thin films, optical properties

Citation
Weijin Kong, Yuanan Zhao, Tao Wang, Jianda Shao, and Zhengxiu Fan, "Laser induced damage of multi-layer dielectric used in pulse compressor gratings," Chin. Opt. Lett. 3, 181-183 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-3-181

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