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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. S1 — Aug. 28, 2005
  • pp: S106–S108

Area-selective deposition of self-assembled monolayers on a synchrotron radiation etching pattern

Changshun Wang and Cunying Sung  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue S1, pp. S106-S108 (2005)


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Abstract

Patterning of self-assembled monolayer (SAM) was demonstrated by area-selective deposition of SAMs on a pattern made by synchrotron radiation (SR) stimulated etching SiO2 thin films. The etching was conducted by exposing the SiO2 films to SR through a Co contact mask with SF6+O2 as the reaction gas. A dodecene SAM was deposited on the etched surface and an octadecyltrichlorosilane SAM was deposited on the SiO2 surface. The deposited SAMs were densely packed and well ordered, which were characterized by infrared spectroscopy, ellipsometer, and water contact angle.

© 2005 Chinese Optics Letters

OCIS Codes
(240.6670) Optics at surfaces : Surface photochemistry
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(340.6720) X-ray optics : Synchrotron radiation

Citation
Changshun Wang and Cunying Sung, "Area-selective deposition of self-assembled monolayers on a synchrotron radiation etching pattern," Chin. Opt. Lett. 3, S106-S108 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-S1-S106


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