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Chinese Optics Letters

Chinese Optics Letters


  • Vol. 9, Iss. 1 — Jan. 10, 2011
  • pp: 013102–

Comparison of laser-induced damage in Ta2O5 and Nb2O5 single-layer films and high reflectors

Cheng Xu, Yulong Zhao, Yinghuai Qiang, Yabo Zhu, Litong Guo, and Jianda Shao  »View Author Affiliations

Chinese Optics Letters, Vol. 9, Issue 1, pp. 013102- (2011)

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Ta2O5 and Nb2O5 films are deposited on BK7 glass substrates using an electron beam evaporation method and are annealed at 673 K in the air. In this letter, comparative studies of the optical transmittance, microstructure, chemical composition, optical absorption, and laser-induced damage threshold (LIDT) of the two films are conducted. Findings indicate that the substoichiometric defect is very harmful to the laser damage resistance of Ta2O5 and Nb2O5 films. The decrease of absorption improves the LIDT in films deposited by the same material. However, although the absorption of the Ta2O5 single layer is less than that of the Nb2O5 single layer, the LIDT of the former is lower than that of the latter. High-reflective (HR) coatings have a higher LIDT than single layers due to the thermal dissipation of the SiO2 layers and the decreased electric field intensity (EFI). In addition, the Nb2O5 HR coating achieves the highest LIDT at 25.6 J/cm2 in both single layers and HR coatings.

© 2011 Chinese Optics Letters

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(160.3380) Materials : Laser materials
(310.6860) Thin films : Thin films, optical properties

Cheng Xu, Yulong Zhao, Yinghuai Qiang, Yabo Zhu, Litong Guo, and Jianda Shao, "Comparison of laser-induced damage in Ta2O5 and Nb2O5 single-layer films and high reflectors," Chin. Opt. Lett. 9, 013102- (2011)

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  1. T. J. Rehg, J. A. Ochoa-Tapia, A. Knoesen, and B. G. Higgins, Appl. Opt. 28, 5215 (1989).
  2. C. R.Wolfe, M. R. Kozlowski, J. H. Campbell, F. Rainer, A. J. Morgan, and R. P. Gonzales, Proc. SPIE 1438, 360 (1989).
  3. P. Ma, S. Chen, F. Pan, Z. Wang, J. Luo, Q. Wu, and J. Shao, Acta Opt. Sin. (in Chinese) 29, 1729 (2009).
  4. X. Ling, D. Li, Y. Zhao, S. Li, J. Shao, and Z. Fan, Chinese J. Lasers (in Chinese) 36, 3055 (2009).
  5. J. Ciosek, W. Paszkowicz, P. Pankowski, J. Pelka, L. Baczewski, J. Marczak, and R. Ostrowski, Proc. SPIE 4449, 276 (2001).
  6. G. Abromavicius, R. Buzelis, R. Drazdys, A. Melninkaitis, D. Miksys, V. Sirutkaitis, A. Skrebutenas, R. Juskenas, and A. Selskis, Proc. SPIE 6403, 640315 (2006).
  7. Y. A. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Z. X. Fan, Appl. Surf. Sci. 210, 353 (2003).
  8. H. Hu, Z. Fan, and F. Luo, Appl. Opt. 40, 1950 (2001).
  9. J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, Thin Solid Films 515, 1674 (2006).
  10. C. Xu, Y. Qiang, Y. Zhu, T. Zhai, L. Guo, Y. Zhao, J. Shao, and Z. Fan, Vacuum 84, 1310 (2010).
  11. H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).
  12. L. Yuan, Y. A. Zhao, G. Q. Shang, C. R. Wang, H. B. He, J. D. Shao, and Z. X. Fan, J. Opt. Soc. Am. B 24, 538 (2007).

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