Abstract
In contrast to uncoated substrate, a nonlinear relationship of phase shift
with the thicknesses of the thin film makes the calculation of wavefront aberration
complicated. A program is compiled to calculate the wavefront aberration of
multilayer thin film produced by thickness nonuniformity. The physical thickness and
the optical phase change on reflection are considered. As an example, the wavefront
aberration of the all-dielectric mirror is presented in ArF excimer lithography
system with a typical thickness distribution. In addition, the wavefront errors of
the thin film at wavelengths of 193 and 633 nm are compared in the one-piece and
two-piece arrangements. Results show that the phase shift upon reflection of the thin
film produced by thickness nonuniformity is very sensitive to the incident angle,
wavelength, and polarization.
© 2012 Chinese Optics Letters
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