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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Editor: Zhizhan Xu
  • Vol. 10, Iss. 12 — Dec. 1, 2012
  • pp: 121202–121202

In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images

Dongbo Xu, Xiangzhao Wang, Yang Bu, Lifeng Duan, Guanyong Yan, Jishuo Yang, and Anatoly Y. Burov  »View Author Affiliations


Chinese Optics Letters, Vol. 10, Issue 12, pp. 121202-121202 (2012)


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Abstract

The impact of lens aberrations becomes severe when the critical dimensions (CDs) shrink. The accurate measurement of both low- and high-order Zernike aberrations is important during a photolithographic process. Based on the multi-illumination settings and principal component analysis of aerial images, a novel in situ aberration measurement technique that can accurately measure all the Zernike aberrations, except for the sinusoidal 2-θ and sinusoidal 4-θ terms (under polar coordinates, and Z1 to Z4 are not considered) is proposed in this letter. The estimated maximum error of the Zernike aberrations ranges from 0.43 to 0.78 mλ when the amplitudes of the Zernike coefficients range from -20 to 20 mλ. The standard and root mean square errors are both in the range from 0.14 to 0.4 mλ.

© 2012 Chinese Optics Letters

OCIS Codes
(110.3960) Imaging systems : Microlithography
(120.3940) Instrumentation, measurement, and metrology : Metrology
(220.1010) Optical design and fabrication : Aberrations (global)

ToC Category:
Instrumentation, Measurement, and Metrology

Citation
Dongbo Xu, Xiangzhao Wang, Yang Bu, Lifeng Duan, Guanyong Yan, Jishuo Yang, and Anatoly Y. Burov, "In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images," Chin. Opt. Lett. 10, 121202-121202 (2012)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-10-12-121202

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