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Chinese Optics Letters

Chinese Optics Letters


  • Editor: Zhizhan Xu
  • Vol. 10, Iss. 12 — Dec. 1, 2012
  • pp: 123401–123401

Small d-spacing WSi2/Si multilayers for X-ray monochromators

Qiushi Huang, Haochuan Li, Jingtao Zhu, Zhanshan Wang, and Yongjian Tang  »View Author Affiliations

Chinese Optics Letters, Vol. 10, Issue 12, pp. 123401-123401 (2012)

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A WSi2/Si multilayer, with 300 bi-layers and a 2.18-nm d-spacing, is designed for X-ray monochromator application. The multilayer is deposited using direct current magnetron sputtering technology. The reflectivity of the 1st-order Bragg peak measured at E=8.05 keV is 38%, and the angular resolution (Δθ/θ) is less than 1.0%. Fitting results of the reflectivity curve indicate a layer thickness drift of 1.6%, mainly accounting for the broadening of the Bragg peaks. The layer morphology is further characterized by transmission electron microscopy, and a well-ordered multilayer structure with sharp interfaces is observed from the substrate to the surface. The material combination of WSi2/Si is a promising candidate for the fabrication of a high-resolution multilayer monochromator in the hard X-ray region.

© 2012 Chinese Optics Letters

OCIS Codes
(230.4170) Optical devices : Multilayers
(340.6720) X-ray optics : Synchrotron radiation
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
X-ray Optics

Qiushi Huang, Haochuan Li, Jingtao Zhu, Zhanshan Wang, and Yongjian Tang, "Small d-spacing WSi2/Si multilayers for X-ray monochromators," Chin. Opt. Lett. 10, 123401-123401 (2012)

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