Novel technique for characterizing feature profiles in photolithography process
Chinese Optics Letters, Vol. 10, Issue 6, pp. 061202- (2012)
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Abstract
A novel angle-resolved scatterometer based on pupil optimization for feature profile measurement in a photolithography process is proposed. The impact of image sensor errors is minimized by optimizing the intensity distribution of the incident light using a spatial light modulator. The scatterometry sensitivity of feature measurement at different polarization conditions is calculated using the rigorous coupled-wave and first-order analyses, and the reproducibility of the scatterometer is evaluated. The results show that the sensitivity and reproducibility of the angle-resolved scatterometer increase by 90% and 40% with pupil optimization, respectively.
© 2012 Chinese Optics Letters
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
ToC Category:
Instrumentation, Measurement, and Metrology
Citation
Fan Wang, Hailiang Lu, Qingyun Zhang, and Anatoly Burov, "Novel technique for characterizing feature profiles in photolithography
process," Chin. Opt. Lett. 10, 061202- (2012)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-10-6-061202
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