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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Editor: Zhizhan Xu
  • Vol. 10, Iss. 6 — Jun. 10, 2012
  • pp: 063102–

Enhanced photocatalytic activity of TiO2 thin film coating on microstructured silicon substrate

Liwei Yang, Yulan Wang, and Li Zhao  »View Author Affiliations


Chinese Optics Letters, Vol. 10, Issue 6, pp. 063102- (2012)


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Abstract

Photocatalytic TiO2 thin film is prepared by sol-gel technique on microstructured silicon substrate produced by femtosecond laser cumulative irradiation. The photocatalytic activity is evaluated by the degradation of methylene blue (MB) solution under ultraviolet (UV) irradiation. For 6-ml MB solution with initial concentration of 3.0 × 10-5 mol/L, the degradation rate caused by TiO2 thin film of 2-cm2 area is higher than 70% after 10-h UV irradiation. Microstructured silicon substrate is found to enhance photocatalytic activity of the TiO2 thin film remarkably. The femtosecond laser microstructured silicon substrate is suitable to support TiO2 thin film photocatalysts.

© 2012 Chinese Optics Letters

OCIS Codes
(240.0310) Optics at surfaces : Thin films
(240.6670) Optics at surfaces : Surface photochemistry
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

Citation
Liwei Yang, Yulan Wang, and Li Zhao, "Enhanced photocatalytic activity of TiO2 thin film coating on microstructured silicon substrate," Chin. Opt. Lett. 10, 063102- (2012)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-10-6-063102

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