To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi2/Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 μm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.
© 2012 Chinese Optics Letters
Diffraction and Gratings
Qiushi Huang, Haochuan Li, Jingtao Zhu, Xiaoqiang Wang, Zhanshan Wang, Lingyan Chen, and Yongjian Tang, "Fabrication and characterization of sliced multilayer transmission grating for X-ray region," Chin. Opt. Lett. 10, 090501-090501 (2012)