Fabrication and characterization of sliced multilayer transmission grating for X-ray region
Chinese Optics Letters, Vol. 10, Issue 9, pp. 090501-090501 (2012)
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Abstract
To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi2/Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 μm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.
© 2012 Chinese Optics Letters
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(310.1860) Thin films : Deposition and fabrication
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
ToC Category:
Diffraction and Gratings
Citation
Qiushi Huang, Haochuan Li, Jingtao Zhu, Xiaoqiang Wang, Zhanshan Wang, Lingyan Chen, and Yongjian Tang, "Fabrication and characterization of sliced multilayer transmission grating for
X-ray region," Chin. Opt. Lett. 10, 090501-090501 (2012)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-10-9-090501
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