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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Editor: Zhizhan Xu
  • Vol. 10, Iss. 9 — Sep. 1, 2012
  • pp: 090501–090501

Fabrication and characterization of sliced multilayer transmission grating for X-ray region

Qiushi Huang, Haochuan Li, Jingtao Zhu, Xiaoqiang Wang, Zhanshan Wang, Lingyan Chen, and Yongjian Tang  »View Author Affiliations


Chinese Optics Letters, Vol. 10, Issue 9, pp. 090501-090501 (2012)


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Abstract

To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi2/Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 μm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.

© 2012 Chinese Optics Letters

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(310.1860) Thin films : Deposition and fabrication
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
Diffraction and Gratings

Citation
Qiushi Huang, Haochuan Li, Jingtao Zhu, Xiaoqiang Wang, Zhanshan Wang, Lingyan Chen, and Yongjian Tang, "Fabrication and characterization of sliced multilayer transmission grating for X-ray region," Chin. Opt. Lett. 10, 090501-090501 (2012)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-10-9-090501


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