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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Editor: Zhizhan Xu
  • Vol. 11, Iss. 4 — Apr. 1, 2013
  • pp: 041401–

Multi-channel DFB laser array fabricated by SAG with optimized epitaxy conditions

Can Zhang, Song Liang, Li Ma, Liangshun Han, and Hongliang Zhu  »View Author Affiliations


Chinese Optics Letters, Vol. 11, Issue 4, pp. 041401- (2013)


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Abstract

Selective area growth (SAG) is performed to fabricate monolithically integrated distributed feedback (DFB) laser array by adjusting the width of a SiO2 mask. A strain-compensated-barrier structure is adopted to reduce the accumulated strain and improve the quality of multi-quantum well materials. Varying the strip width of the SAG masks, the DFB laser array with an average channel spacing of 1.47 nm is demonstrated by a conventional holographic method with constant-pitch grating. The threshold current from 14 to 18 mA and over 35-dB side mode suppression ratio (SMSR) are obtained for all DFB lasers in the array.

© 2013 Chinese Optics Letters

OCIS Codes
(140.2010) Lasers and laser optics : Diode laser arrays
(140.3570) Lasers and laser optics : Lasers, single-mode
(250.5300) Optoelectronics : Photonic integrated circuits
(250.5960) Optoelectronics : Semiconductor lasers

ToC Category:
Lasers and Laser Optics

Citation
Can Zhang, Song Liang, Li Ma, Liangshun Han, and Hongliang Zhu, "Multi-channel DFB laser array fabricated by SAG with optimized epitaxy conditions," Chin. Opt. Lett. 11, 041401- (2013)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-11-4-041401


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References

  1. Y. Suzaki, H. Yasaka, H. Mawatari, K. Yoshino, Y. Kawaguchi, S. Oku, R. Iga, and H. Okamoto, IEEE J. Sel. Top. Quantum Electron. 11, 43 (2005).
  2. R. Nagarajan, C. H. Joyner, R. P. Schneider, J. S. Bostak, T. Butrie, A. G. Dentai, V. G. Dominic, P. W. Evans, M. Kato, M. Kauffman, D. J. H. Lambert, S. K. Mathis, A. Mathur, R. H. Miles, M. L. Mitchell, M. J. Missey, S. Murthy, A. C. Nilsson, F. H. Peters, S. C. Pennypacker, J. L. Pleumeekers, R. A. Salvatore, R. K. Schlenker, R. B. Taylor, T. Huan-Shang, M. F. Van Leeuwen, J. Webjorn, M. Ziari, D. Perkins, J. Singh, S. G. Grubb, M. S. Reffle, D. G. Mehuys, F. A. Kish, and D. F. Welch, IEEE J. Sel. Top. Quantum Electron. 11, 50 (2005).
  3. D. F. Welch , F. A. Kish, S. Melle, R. Nagarajan, M. Kato, C. H. Joyner, J. L. Pleumeekers, R. P. Schneider, J. Back, A. G. Dentai, V. G. Dominic, P. W. Evans, M. Kauffman, D. J. H. Lambert, S. K. Hurtt, A. Mathur, M. L. Mitchell, M. Missey, S. Murthy, A. C. Nilsson, R. A. Salvatore, M. F. Van Leeuwen, J. Webjorn, M. Ziari, S. G. Grubb, D. Perkins, M. Reffle, and D. G. Mehuys, IEEE J. Sel. Top. Quantum Electron. 13, 22 (2007).
  4. S. Corzine, P. Evans, M. Fisher, J. Gheorma, M. Kato, V. Dominic, P. Samra, A. Nilsson, J. Rahn, I. Lyubomirsky, A. Dentai, P. Studenkov, M. Missey, D. Lambert, A. Spannagel, R. Muthiah, R. Salvatore, S. Murthy, E. Strzelecka, J. L. Pleumeekers, A. Chen, R. Schneider, R. Nagarajan, M. Ziari, J. Stewart, C. H. Joyner, F. Kish, and D. F. Welch, IEEE Photon. Technol. Lett. 22, 1015 (2010).
  5. T. Fujisawa, S. Kanazawa, K. Takahata, W. Kobayashi, T. Tadokoro, H. Ishii, and F. Kano, Opt. Express 20, 614 (2012).
  6. H. Ishii, K. Kasaya, and H. Oohashi, IEEE J. Sel. Top. Quantum Electron. 15, 514 (2009).
  7. S. Sakamoto, T. Okamoto, T. Yamazaki, S. Tamura, and S. Arai, IEEE J. Sel. Top. Quantum Electron. 11, 1174 (2005).
  8. L. P. Hou, M. Haji, J. Akbar, J. H. Marsh, and A. C. Bryce, Opt. Lett. 36, 4188 (2011).
  9. G. P. Li, T. Makino, A. Sarangan, and W. Huang, IEEE Photon. Technol. Lett. 8, 22 (1996).
  10. Y. Shi, X. Chen, Y. Zhou, S. Li, L. Lu, R. Liu, and Y. Feng, Opt. Lett. 37, 3315 (2012).
  11. H. L. Zhu, X. D. Xu, H. Wang, D. H. Kong, S. Liang, L. J. Zhao, and W. Wang, IEEE Photon. Technol. Lett. 22, 353 (2010).
  12. M. Zanola, M. J. Strain, G. Giuliani, and M. Sorel, IEEE Photon. Technol. Lett. 24, 1063 (2012).
  13. N. Nunoya, H. Ishii, Y. Kawaguchi, R. Iga, T. Sato, N. Fujiwara, and H. Oohashi, IEEE J. Sel. Top. Quantum Electron. 17, 1505 (2011).
  14. L. J. P. Ketelsen, J. A. Grenko, S. K. Sputz, M.W. Focht, J. M. Vandenberg, J. E. Johnson, C. L. Reynolds, J. M. Geary, J. Levkoff, K. G. Glogovsky, D. V. Stampone, S. N. G. Chu, T. Siegrist, T. L. Pernell, F. S. Walters, J. Sheridan-Eng, J. L. Lentz, M. A. Alam, R. People, M. S. Hybertsen, E. D. Isaacs, K. Evans-Lutterodt, R. E. Leibenguth, G. J. Przybyiek, L. Zhang, K. Feder, S. Shunk, D. M. Tennant, L. J. Peticolas, D. M. Romero, J. M. Freund, B. S. Falk, N. N. Tzafaras, L. E. Smith, L. C. Luther, M. Geva, W. A. Gault, and J. L. Zilko, IEEE J. Quantum Electron. 36, 641 (2000).
  15. Y. B. Cheng, J. Q. Pan, Y. Wang, F. Zhou, B. J. Wang, L. J. Zhao, H. L. Zhu, and W. Wang, IEEE Photon. Technol. Lett. 21, 356 (2009).
  16. Q. Zhao, J. Q. Pan, J. Zhang, B. X. Li, F. Zhou, B. J. Wang, L. F. Wang, J. Bian, L. J. Zhao, and W. Wang, Opt. Commun. 260, 666 (2006).
  17. S. W. Ryu, J. S. Sim, Y. H. Kwan, S. B. Kim, and Y. S. Baek, Semicond. Sci. Technol. 23, 055012 (2008).
  18. T. Kihara, Y. Nitta, H. Suda, K. Miki, and K. Shimomura, J. Cryst. Growth 221, 196 (2000).
  19. K. S. Chiang, K. M. Lo, and K. S. Kwok, J. Lightwave Technol. 14, 223 (1996).
  20. A. Polemi, A. Alu, and N. Engheta, IEEE Antenn. Wireless Propag. Lett. 10, 199 (2011).
  21. Nishikata, H. Shimizu, K. Hiraiwa, S. Yoshida, N. Yamanaka, M. Irikawa, and A. Kasukawa, J. Cryst. Growth 175-176, 990 (1997).

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