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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Editor: Zhizhan Xu
  • Vol. 11, Iss. 5 — May. 1, 2013
  • pp: 053002–

Repetition rate dependence of absorption of fused silica irradiated at 193 nm

Weijing Liu and Bincheng Li  »View Author Affiliations


Chinese Optics Letters, Vol. 11, Issue 5, pp. 053002- (2013)


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Abstract

Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50-1 000 Hz with an ArF laser calorimeter. The "apparent" single- and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.

© 2013 Chinese Optics Letters

OCIS Codes
(140.2180) Lasers and laser optics : Excimer lasers
(160.4670) Materials : Optical materials
(300.1030) Spectroscopy : Absorption

ToC Category:
Spectroscopy

Citation
Weijing Liu and Bincheng Li, "Repetition rate dependence of absorption of fused silica irradiated at 193 nm," Chin. Opt. Lett. 11, 053002- (2013)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-11-5-053002


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