An analytical model is derived to describe the stress mechanism in a thin film against the laser-induced damage threshold (LIDT) based on the thermal transfer equation. Different structures of high-reflection films at 355 nm are prepared to validate this model. LIDTs are found to have a linear relationship with stress. Furthermore, predictions from the simple model agree with the experiments.
© 2013 Chinese Optics Letters
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.3380) Lasers and laser optics : Laser materials
(140.3440) Lasers and laser optics : Laser-induced breakdown
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
Zhenkun Yu, Hongbo He, Xu Li, Hongji Qi, and Wenwen Liu, "Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation," Chin. Opt. Lett. 11, 073101- (2013)