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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Editor: Zhizhan Xu
  • Vol. 11, Iss. 7 — Jul. 1, 2013
  • pp: 073101–

Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation

Zhenkun Yu, Hongbo He, Xu Li, Hongji Qi, and Wenwen Liu  »View Author Affiliations


Chinese Optics Letters, Vol. 11, Issue 7, pp. 073101- (2013)


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Abstract

An analytical model is derived to describe the stress mechanism in a thin film against the laser-induced damage threshold (LIDT) based on the thermal transfer equation. Different structures of high-reflection films at 355 nm are prepared to validate this model. LIDTs are found to have a linear relationship with stress. Furthermore, predictions from the simple model agree with the experiments.

© 2013 Chinese Optics Letters

OCIS Codes
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.3380) Lasers and laser optics : Laser materials
(140.3440) Lasers and laser optics : Laser-induced breakdown
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings

ToC Category:
Thin Films

Citation
Zhenkun Yu, Hongbo He, Xu Li, Hongji Qi, and Wenwen Liu, "Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation," Chin. Opt. Lett. 11, 073101- (2013)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-11-7-073101

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