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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Editor: Zhizhan Xu
  • Vol. 11, Iss. 9 — Sep. 1, 2013
  • pp: 090802–

Glass homogeneity effect on wavefront aberration in lithography projection lens

Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, and Wang Yang  »View Author Affiliations


Chinese Optics Letters, Vol. 11, Issue 9, pp. 090802- (2013)


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Abstract

Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve analysis accuracy, we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.

© 2013 Chinese Optics Letters

OCIS Codes
(220.1000) Optical design and fabrication : Aberration compensation
(220.3740) Optical design and fabrication : Lithography
(080.3095) Geometric optics : Inhomogeneous elements in optical systems

ToC Category:
Geometric Optics

Citation
Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, and Wang Yang, "Glass homogeneity effect on wavefront aberration in lithography projection lens," Chin. Opt. Lett. 11, 090802- (2013)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-11-9-090802


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