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Optica Publishing Group
  • Chinese Optics Letters
  • Vol. 2,
  • Issue 1,
  • pp. 4-6
  • (2004)

Laser writing system for fabrication of diffractive optics elements

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Abstract

We report a laser writing system for fabrication of diffractive optical elements with He-Cd laser. The wavelength of the light source is 441.6 nm. The output beam is collimated into parallel light with uniform intensity distribution after passing through the spatial filter with a pinhole of 25 um and the collimating device. A microscopy objective lens with numerical aperture (NA) of 0.65 is used to focus the beam into a small diffraction spot. Any pattern can be written with this system. Experimental results are presented. The written gratings and the phase patterns were verified with a conventional optical microscopy and the Taylor Hobson equipment.

© 2005 Chinese Optics Letters

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