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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 2, Iss. 4 — Apr. 10, 2004
  • pp: 187–189

Classical simulation of atomic beam focusing and deposition for atom lithography

Xianzhong Chen, Hanmin Yao, and Xunan Chen  »View Author Affiliations


Chinese Optics Letters, Vol. 2, Issue 4, pp. 187-189 (2004)


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Abstract

We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.

© 2005 Chinese Optics Letters

OCIS Codes
(020.7010) Atomic and molecular physics : Laser trapping
(140.3320) Lasers and laser optics : Laser cooling

Citation
Xianzhong Chen, Hanmin Yao, and Xunan Chen, "Classical simulation of atomic beam focusing and deposition for atom lithography," Chin. Opt. Lett. 2, 187-189 (2004)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-2-4-187


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