We start from the intensity distribution of a standing wave (SW) laser field and deduce the classical equation of atomic motion. The image distortion is analyzed using transfer function approach. Atomic flux density distribution as a function of propagation distance is calculated based on Monte-Carlo scheme and trajectory tracing method. Simulation results have shown that source imperfection, especially beam spread, plays an important role in broadening the feature width, and the focus depth of atom lens for real atomic source is longer than that for perfect source. The ideal focal plane can be easily determined by the variation of atomic density at the minimal potential of the laser field as a function of traveling distance.
© 2005 Chinese Optics Letters
Xianzhong Chen, Hanmin Yao, and Xunan Chen, "Classical simulation of atomic beam focusing and deposition for atom lithography," Chin. Opt. Lett. 2, 187-189 (2004)