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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 2, Iss. 4 — Apr. 10, 2004
  • pp: 246–248

Femtosecond laser induced defects in various silica glasses

Qinling Zhou, Liying Liu, Lei Xu, Wencheng Wang, Jianrong Qiu, Congshan Zhu, and Fuxi Gan  »View Author Affiliations


Chinese Optics Letters, Vol. 2, Issue 4, pp. 246-248 (2004)


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Abstract

The mechanism of near infrared (IR) focused femtosecond (fs) laser induced defects in silica glasses produced by different methods is systematically investigated through measurements of absorption, fluorescence, and electronic spin resonance (ESR) spectra. The influence of impurities and hydroxyl groups on defects is discussed. The results show that ES silica glasses containing high OH and few defects are much stable under fs laser irradiation. It is also verified that Si E?' center formation has no direct relation with chloride ions.

© 2005 Chinese Optics Letters

OCIS Codes
(160.2750) Materials : Glass and other amorphous materials
(300.6250) Spectroscopy : Spectroscopy, condensed matter
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors

Citation
Qinling Zhou, Liying Liu, Lei Xu, Wencheng Wang, Jianrong Qiu, Congshan Zhu, and Fuxi Gan, "Femtosecond laser induced defects in various silica glasses," Chin. Opt. Lett. 2, 246-248 (2004)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-2-4-246

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