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Chinese Optics Letters

Chinese Optics Letters


  • Vol. 2, Iss. 5 — May. 10, 2004
  • pp: 308–310

Study for infrared spectroscopic ellipsometric properties of diamond films

Linjun Wang, Yiben Xia, Hujiang Shen, Minglong Zhang, Ying Yang, and Lin Wang  »View Author Affiliations

Chinese Optics Letters, Vol. 2, Issue 5, pp. 308-310 (2004)

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Spectroscopicellipsometric measurements in infrared region (2.5-12.5 um) are carried out to characterize the structure and quality of diamond films grown by microwave plasma chemical vapor deposition (MPCVD) and hot filament chemical vapor deposition (HFCVD), respectively. It is found that the establishment of appropriate models has the strongest influence on the fit of ellipsometric spectra. The best fit is achieved for MPCVD film with a 77.5-nm middle layer of SiO2, and for HFCVD film with an 879-nm rough surface layer included by Bruggeman effective medium approtimation (EMA). Finally the refractive index and the extinction coefficient are calculated for both films, the results show that the film grown by MPCVD is optically much better than that grown by HFCVD at infrared wavelengths.

© 2005 Chinese Optics Letters

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(310.6860) Thin films : Thin films, optical properties

Linjun Wang, Yiben Xia, Hujiang Shen, Minglong Zhang, Ying Yang, and Lin Wang, "Study for infrared spectroscopic ellipsometric properties of diamond films," Chin. Opt. Lett. 2, 308-310 (2004)

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