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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 2, Iss. 8 — Aug. 10, 2004
  • pp: 438–440

A flat-topped etched diffraction grating demultiplexer with low polarization-dependent loss using a tapered MMI structure

Jun Song and Sailing He  »View Author Affiliations


Chinese Optics Letters, Vol. 2, Issue 8, pp. 438-440 (2004)


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Abstract

A flat-topped etched diffraction grating (EDG) demultiplexer with a low polarization-dependent loss (PDL) is designed. A design and simulation method based on the method of moment (MoM) is proposed. A 65-channel EDG demultiplexer with channel spacing of 100 GHz is considered as a design example. A tapered multi-mode interferometer (MMI) is used to flatten the passband of the EDG demultiplexer. The numerical results show that the exit width of the tapered waveguide impacts the loss of the TE case more than that of the TM case. Based on this fact, the exit width of the taper is optimized to obtain the lowest PDL. The tapering angle is also optimized where the minimal ripple is obtained. The designed EDG demultiplexer has an excellent flat-topped spectral response and a very low PDL.

© 2005 Chinese Optics Letters

OCIS Codes
(060.4230) Fiber optics and optical communications : Multiplexing
(060.4510) Fiber optics and optical communications : Optical communications

Citation
Jun Song and Sailing He, "A flat-topped etched diffraction grating demultiplexer with low polarization-dependent loss using a tapered MMI structure," Chin. Opt. Lett. 2, 438-440 (2004)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-2-8-438


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References

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