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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. S1 — Aug. 28, 2005
  • pp: S141–S142

High-efficiency diffraction gratings in fused silica at the wavelength of 632.8 nm

Yanyan Zhang, Changhe Zhou, Shunquan Wang, and Huayi Ru  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue S1, pp. S141-S142 (2005)


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Abstract

We describe high-efficiency diffraction gratings fabricated in fused silica at the wavelength of 632.8 nm by rigorous coupled-wave analysis (RCWA). High-density holographic gratings, if the groove density falls within the range of 1575-1630 lines/mm and the groove depth within the range of 1.1-1.3 microns, can realize high diffraction efficiencies at the wavelength of 632.8 nm, e.g., the first Bragg diffraction efficiency can theoretically achieve more than 93% both in TE- and TM-polarized incidences, which greatly reduces the polarization-dependent losses. Note that with different groove profiles further optimized, the maximum efficiency of more than 99.69% can be achieved for TM-polarized incidence, or 97.81% for TE-polarized incidence.

© 2005 Chinese Optics Letters

OCIS Codes
(000.4430) General : Numerical approximation and analysis
(050.1950) Diffraction and gratings : Diffraction gratings
(090.2890) Holography : Holographic optical elements

Citation
Yanyan Zhang, Changhe Zhou, Shunquan Wang, and Huayi Ru, "High-efficiency diffraction gratings in fused silica at the wavelength of 632.8 nm," Chin. Opt. Lett. 3, S141-S142 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-S1-S141


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