Fabrication of fused silica phase gratings with inductively coupled plasma technology
Chinese Optics Letters, Vol. 3, Issue S1, pp. S79-S81 (2005)
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Abstract
Inductively coupled plasma (ICP) technology is a new advanced version of dry-etching technology compared with the widely used method of reactive ion etching (RIE). Plasma processing of the ICP technology is complicated due to the mixed reactions among discharge physics, chemistry and surface chemistry. Extensive experiments have been done and microoptical elements have been fabricated successfully, which proved that the ICP technology is very effective in dry etching of microoptical elements. In this paper, we present the detailed fabrication of microoptical fused silica phase gratings with ICP technology. Optimized condition has been found to control the etching process of ICP technology and to improve the etching quality of microoptical elements greatly. With the optimized condition, we have fabricated lots of good gratings with different periods, depths, and duty cycles. The fabricated gratings are very useful in fields such as spectrometer, high-efficient filter in wavelength-division-multiplexing system, etc..
© 2005 Chinese Optics Letters
OCIS Codes
(050.1380) Diffraction and gratings : Binary optics
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.1950) Optical devices : Diffraction gratings
Citation
Shunquan Wang, Changhe Zhou, Huayi Ru, and Yanyan Zhang, "Fabrication of fused silica phase gratings with inductively coupled plasma technology," Chin. Opt. Lett. 3, S79-S81 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-S1-S79
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