OSA's Digital Library

Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. 12 — Dec. 10, 2005
  • pp: 719–721

Nanostructure and thermal-optical properties of vanadium dioxide thin films

Yi Li, Xinjian Yi, and Tianxu Zhang  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue 12, pp. 719-721 (2005)


View Full Text Article

Acrobat PDF (319 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations
  • Export Citation/Save Click for help

Abstract

A novel nanopolycrystalline structure of vanadium dioxide thin films is deposited on silicon or fused silica substrates by reactive ion sputtering and followed by an annealing. The characteristic analysis shows that the films have a columnar nanostructure with an average grain of 8 nm. The resistivities as a function of ambient temperatures tested by four-point probes for as-deposited films present that the transition temperature for nanostructure of vanadium dioxide films is near 35 Celsius degree which lowers about 33 Celsius degree in comparison with the transition temperature at 68 Celsius degree in its microstructure.

© 2005 Chinese Optics Letters

OCIS Codes
(160.1890) Materials : Detector materials
(160.6840) Materials : Thermo-optical materials
(310.0310) Thin films : Thin films
(350.5030) Other areas of optics : Phase

Citation
Yi Li, Xinjian Yi, and Tianxu Zhang, "Nanostructure and thermal-optical properties of vanadium dioxide thin films," Chin. Opt. Lett. 3, 719-721 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-12-719


Sort:  Author  |  Year  |  Journal  |  Reset

References

  1. F. Gninneton, L. Sauques, J.-C. Valmalette, F. Cros, and J. R. Gavarri, Thin Solid Films 446, 287 (2004).
  2. S. H. Chen, X. J. Yi, and H. Ma, Opt. and Quantum Electron. 35, 1351 (2003).
  3. B. E. Cole, R. E. Higashi, and R. A. Wood, Proceedings of the IEEE 86, 1679 (1998).
  4. R. A. Wood, in Uncooled Infrared Imaging Arrays and Systems P. Kruse and D. Skatrud (eds.) (Academic Press, New York, 1997) chap.3, pp.43-121.
  5. C. Chen, X. Yi, J. Zhang, and X. Zhao, Infrared Phys. & Technol. 42, 87 (2001).
  6. M. A. Richardson and J. A. Coath, Opt. & Laser Technol. 30, 137 (1998).
  7. M. H. Lee, Sol. Energy Mater. and Sol. Cells 71, 537 (2002).
  8. M. H. Lee and J. S. Cho, Thin Solid Films 365, 5 (2000).
  9. V. L. Galperin, I. A. Khakhaev, F. A. Chudnovskii, and E. B. Shadrin, Sov. Phys. Tech. Phys. 43, 235 (1998).
  10. L. A. L. de Almeide, G. S. Deep, A. M. N. Lima, H. F. Neff, and R. C. S. Freire, IEEE Trans. Instrumentation and Measurement 50, 1030 (2001).
  11. G. V. Jorgenson and J. C. Lee, Sol. Energy Mater. 14, 205 (1986).
  12. S. Lu, L. Hou, and F. Gan, Thin Solid Films 353, 40 (1999).

Cited By

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited