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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. 2 — Feb. 10, 2005
  • pp: 63–65

In-situ end-point detection during ion-beam etching of multilayer dielectric gratings

Hua Lin, Lifeng Li, and Lijiang Zeng  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue 2, pp. 63-65 (2005)


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Abstract

An in-situ end-point detection technique for ion-beam etching is presented. A laser beam of the same wavelength and polarization as those in the intended application of the grating is fed into the vacuum chamber, and the beam retro-diffracted by the grating under etching is extracted and detected outside the chamber. This arrangement greatly simplifies the end-point detection. Modeling the grating diffraction with a rigorous diffraction grating computer program, we can satisfactorily simulate the evolution of the diffraction intensity during the etching process and consequently, we can accurately predict the end-point. Employing the proposed technique, we have reproducibly fabricated multilayer dielectric gratings with diffraction efficiencies of more than 92%.

© 2005 Chinese Optics Letters

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1950) Diffraction and gratings : Diffraction gratings
(050.2770) Diffraction and gratings : Gratings

Citation
Hua Lin, Lifeng Li, and Lijiang Zeng, "In-situ end-point detection during ion-beam etching of multilayer dielectric gratings," Chin. Opt. Lett. 3, 63-65 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-2-63

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