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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. 2 — Feb. 10, 2005
  • pp: 63–65

In-situ end-point detection during ion-beam etching of multilayer dielectric gratings

Hua Lin, Lifeng Li, and Lijiang Zeng  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue 2, pp. 63-65 (2005)


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Abstract

An in-situ end-point detection technique for ion-beam etching is presented. A laser beam of the same wavelength and polarization as those in the intended application of the grating is fed into the vacuum chamber, and the beam retro-diffracted by the grating under etching is extracted and detected outside the chamber. This arrangement greatly simplifies the end-point detection. Modeling the grating diffraction with a rigorous diffraction grating computer program, we can satisfactorily simulate the evolution of the diffraction intensity during the etching process and consequently, we can accurately predict the end-point. Employing the proposed technique, we have reproducibly fabricated multilayer dielectric gratings with diffraction efficiencies of more than 92%.

© 2005 Chinese Optics Letters

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1950) Diffraction and gratings : Diffraction gratings
(050.2770) Diffraction and gratings : Gratings

Citation
Hua Lin, Lifeng Li, and Lijiang Zeng, "In-situ end-point detection during ion-beam etching of multilayer dielectric gratings," Chin. Opt. Lett. 3, 63-65 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-2-63


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References

  1. B. W. shore, M. D. Perry, J. A. Britten, R. D. Boyd, M. D. Feit, H. T. Nguyen, R. Chow, G. E. Loomis, and L. F. Li, J. Opt. Soc. Am. A 14, 1124 (1997).
  2. K. Hehl, J. Bischoff, U. Mohaupt, M. Palme, B. Schnabel, L. Wenke, R. Bodefeld, W. Theobald, E. Welsch, R. Sauerbrey, and H. Heyer, Appl. Opt. 38, 6257 (1999).
  3. S. Bosch-Charpenay, J. Z. Xu, J. Haigis, P. A. Rosenthal, P. R. Solomon, and J. M. Bustillo, J. Microelectromech. Syst. 11, 111 (2002).
  4. M. M. Bourke, K. P. Hilton, M. A. Crouch, M. J. Kane, N. Borsing, and T. Russell, in IEEE Workshop on High Performance Electron Devices for Microwave and Optoelectronic Applications 14 (1995).
  5. C. P. Chao, S. Y. Hu, P. Floyd, K-K. Law, S. W. Corzine, J. L. Merz, A. C. Gossard, and L. A. Coldren, IEEE Photon. Technol. Lett. 3, 585 (1991).
  6. A. S. Svakhin, V. A. Sychugov, and A. E. Tikhomirov, Quantum Electron. 24, 233 (1994).
  7. J. S. Zhao, L. F. Li, and Z. H. Wu, Acta Opt. Sin. (in Chinese) 24, 851 (2004).
  8. J. S. Zhao, L. F. Li, Z. H. Wu, Acta Opt. Sin. (in Chinese) 24, 1285 (2004).

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