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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. 3 — Mar. 10, 2005
  • pp: 179–180

Damage on HfO2/SiO2 high-reflecting coatings under single and multiple Nd:YAG laser pulse irradiation

Weidong Gao, Tao Wang, Yuanan Zhao, and Jianda Shao  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue 3, pp. 179-180 (2005)


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Abstract

The single- and multi-shot damage behaviors of HfO2/SiO2 high-reflecting (HR) coatings under Nd:YAG laser exposure were investigated. Fundamental aspects of multi-shot laser damage, such as the instability due to pulse-to-pulse accumulation of absorption defect and structural defect effect, and the mechanism of laser induced defect generation, are considered. It was found in multi-shot damage, the main factors influencing laser-induced damage threshold (LIDT) are accumulation of irreversible changes of structural defects and thermal stress that induced by thermal density fluctuations.

© 2005 Chinese Optics Letters

OCIS Codes
(310.0310) Thin films : Thin films
(310.6870) Thin films : Thin films, other properties

Citation
Weidong Gao, Tao Wang, Yuanan Zhao, and Jianda Shao, "Damage on HfO2/SiO2 high-reflecting coatings under single and multiple Nd:YAG laser pulse irradiation," Chin. Opt. Lett. 3, 179-180 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-3-179

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