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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. 5 — May. 10, 2005
  • pp: 302–304

Research on OEF geometry control algorithm in dual-galvanometric laser scanning manufacturing

Huilai Sun, Shuzhong Lin, and Tao Wang  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue 5, pp. 302-304 (2005)


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Abstract

For the dual-galvanometric laser scanning manufacturing, the traditional geometry algorithm-f? only considered the distance between the two swaying mirrors, the distance between the swaying mirror and the convex lens, the mirror swaying angle, and the lens focal length. And it could not correctly express the manufacturing track which was made geometry distorted. Based on analysis, a creative geometry control algorithm --- optical entire factors (OEF) was brought forward. From the creative algorithm it can be known that OEF geometry control algorithm was concerned with not only the distance of the two swaying mirrors, distance between the swaying mirror and the convex lens, mirror swaying angle, and lens focal length, but also the lens central height, lens convex radius, and medium refractive index. The manufacturing system can manufacture satisfied geometry with the creative double ends approach (DEA) control model based on OEF in the experiments.

© 2005 Chinese Optics Letters

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.4880) Optical design and fabrication : Optomechanics

Citation
Huilai Sun, Shuzhong Lin, and Tao Wang, "Research on OEF geometry control algorithm in dual-galvanometric laser scanning manufacturing," Chin. Opt. Lett. 3, 302-304 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-5-302

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