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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 3, Iss. 9 — Sep. 10, 2005
  • pp: 513–515

Study on eight-pass dual-frequency laser interferometer with nanometer precision

Haijun Gao, Zhaogu Cheng, Zhigao Ning, Pinjing Cui, and Huijie Huang  »View Author Affiliations


Chinese Optics Letters, Vol. 3, Issue 9, pp. 513-515 (2005)


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Abstract

A new dual-frequency laser displacement measurement interferometer with nanometer precision has been developed. An eight-pass optical subdivision technology is proposed to improve resolution based on commercial interferometers. A static positioning error measuring method has been used to examine the precision and repeatability of the laser interferometer. An optical resolution of 1.24 nm and an accuracy of nanometer scale have been achieved.

© 2005 Chinese Optics Letters

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(250.0250) Optoelectronics : Optoelectronics

Citation
Haijun Gao, Zhaogu Cheng, Zhigao Ning, Pinjing Cui, and Huijie Huang, "Study on eight-pass dual-frequency laser interferometer with nanometer precision," Chin. Opt. Lett. 3, 513-515 (2005)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-3-9-513


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References

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