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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 4, Iss. 10 — Oct. 1, 2006
  • pp: 611–613

B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

Zhanshan Wang, Shumin Zhang, Wenjuan Wu, Jingtao Zhu, Hongchang Wang, Cunxia Li, Yao Xu, Fengli Wang, Zhong Zhang, Lingyan Chen, Hongjun Zhou, and Tonglin Huo  »View Author Affiliations


Chinese Optics Letters, Vol. 4, Issue 10, pp. 611-613 (2006)


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Abstract

The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5 degrees. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.

© 2006 Chinese Optics Letters

OCIS Codes
(230.4170) Optical devices : Multilayers
(340.6720) X-ray optics : Synchrotron radiation
(340.7470) X-ray optics : X-ray mirrors

Citation
Zhanshan Wang, Shumin Zhang, Wenjuan Wu, Jingtao Zhu, Hongchang Wang, Cunxia Li, Yao Xu, Fengli Wang, Zhong Zhang, Lingyan Chen, Hongjun Zhou, and Tonglin Huo, "B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm," Chin. Opt. Lett. 4, 611-613 (2006)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-4-10-611


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