The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5 degrees. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.
© 2006 Chinese Optics Letters
Zhanshan Wang, Shumin Zhang, Wenjuan Wu, Jingtao Zhu, Hongchang Wang, Cunxia Li, Yao Xu, Fengli Wang, Zhong Zhang, Lingyan Chen, Hongjun Zhou, and Tonglin Huo, "B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm," Chin. Opt. Lett. 4, 611-613 (2006)