The influence of oxygen partial pressure on the optical properties of NiOx thin films deposited by reactive DC-magnetron sputtering from a nickel metal target in a mixture gas of oxygen and argon was presented. With the oxygen ratio increasing, the reflectivity of the as-deposited films decreased, and optical band gap increased. Thermogravimetric analysis (TGA) showed that the decompose temperature of the films was above 250 Celsius degrees. After annealed at 400 Celsius degrees, only films deposited at 5% O2/Ar ratio showed high optical contrast which was about 52%. Scanning electron microscope (SEM) results revealed that the changes of surface morphology were responsible for the optical property variations of the films after annealing. Its thermal stability and high optical contrast before and after annealing made it a good potential write-once optical recording medium.
© 2006 Chinese Optics Letters
(210.4810) Optical data storage : Optical storage-recording materials
(300.6470) Spectroscopy : Spectroscopy, semiconductors
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
Ying Zhou, Yongyou Geng, and Donghong Gu, "Effects of oxygen partial pressure on optical properties of NiOx films deposited by reactive DC-magnetron sputtering," Chin. Opt. Lett. 4, 678-681 (2006)