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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 4, Iss. 3 — Mar. 10, 2006
  • pp: 170–172

DC discharge characteristics and fluorine atom yield in NF3/He

Liping Duo, Shukai Tang, Haijun Yu, Jian Wang, Xiangde Min, Liucheng Li, Yuqi Jin, Bailing Yang, and Fengting Sang  »View Author Affiliations


Chinese Optics Letters, Vol. 4, Issue 3, pp. 170-172 (2006)


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Abstract

DC discharge characteristics of NF3/He have been investigated experimentally under different experimental conditions, for example, different electrode materials, separations, flow rates of the gas NF3 or He, and series resistances. The optimum discharge parameters and the fluorine atom yield from the DC discharge of NF3/He as function of load power are studied experimentally.

© 2005 Chinese Optics Letters

OCIS Codes
(140.1340) Lasers and laser optics : Atomic gas lasers
(140.1550) Lasers and laser optics : Chemical lasers

Citation
Liping Duo, Shukai Tang, Haijun Yu, Jian Wang, Xiangde Min, Liucheng Li, Yuqi Jin, Bailing Yang, and Fengting Sang, "DC discharge characteristics and fluorine atom yield in NF3/He," Chin. Opt. Lett. 4, 170-172 (2006)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-4-3-170

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