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Chinese Optics Letters

Chinese Optics Letters

| PUBLISHED MONTHLY BY CHINESE LASER PRESS AND DISTRIBUTED BY OSA

  • Vol. 5, Iss. 10 — Oct. 10, 2007
  • pp: 602–604

Quantum simulation for peak broadening in atom lithography

Min Zhao, Zhanshan Wang, Yan Ma, Bin Ma, and Fosheng Li  »View Author Affiliations


Chinese Optics Letters, Vol. 5, Issue 10, pp. 602-604 (2007)


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Abstract

A grating structure with period of half of the laser wavelength generated by focusing Cr atoms with nearly resonant laser standing wave atom lens was simulated using a quantum-mechanical model. The influence of thermal atomic source on atom focusing, including the statistical distribution of the longitudinal velocity and the beam divergence, was discussed. The background and full-width at half-maximum (FWHM) of atomic density peaks with vz in Maxwell distribution and vx0 in Gaussian distribution increase significantly compared with ideal atoms. Collimating atoms with laser cooling is necessary to decrease the peak broadening.

© 2007 Chinese Optics Letters

OCIS Codes
(020.0020) Atomic and molecular physics : Atomic and molecular physics
(260.0260) Physical optics : Physical optics
(270.0270) Quantum optics : Quantum optics

Citation
Min Zhao, Zhanshan Wang, Yan Ma, Bin Ma, and Fosheng Li, "Quantum simulation for peak broadening in atom lithography," Chin. Opt. Lett. 5, 602-604 (2007)
http://www.opticsinfobase.org/col/abstract.cfm?URI=col-5-10-602

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